Specifications
Brand Name :
XDEM
Model Number :
XDEM-1200T-PECVD
Certification :
ISO, CE
Place of Origin :
China
MOQ :
1 set
Price :
$380-5900 US dollars/set
Payment Terms :
L/C, T/T, Western Union, MoneyGram
Supply Ability :
60 sets per month
Delivery Time :
15 working days
Packaging Details :
wooden box with polyfoam filled all sides
Max. temperature :
1200C
Working temperature :
not more than 1100C
Heating rate :
0-20'C
Temperature uniformity :
±5℃
tube diameter :
customer size
Heating Element :
Resistance wire with Mo
Temperature Control :
PID automatic control via SCR power control
Description

Plasma Enhanced Chemical Vapor Deposition PECVD System Machine

PECVD system, by ionizing atom-containing gas with microwave or radio frequency, create active plasma locally, which will react easily to deposit and form the expected thin film. It is suitable for the PECVD process, such as silicon carbide coating ceramic substrate conductivity test, controlled growth of ZnO nanostructures, ceramic capacitors(MLCC) atomosphere sintering experiment,etc.

Product Display:

ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System

ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System

ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System

Packing & Shipping:

Wooden box with polyfoam filled inside to ensure safe transportation.

ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System

Parcels can be sent by sea, by air, by express,etc per customer's request.

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ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System

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Brand Name :
XDEM
Model Number :
XDEM-1200T-PECVD
Certification :
ISO, CE
Place of Origin :
China
MOQ :
1 set
Price :
$380-5900 US dollars/set
Contact Supplier
ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System

Nanyang Xinda Electro-Mechanical Co., Ltd.

Verified Supplier
5 Years
henan, nanyang
Since 2012
Business Type :
Importer, Exporter, Trading Company
Total Annual :
150w-200w
Employee Number :
15~20
Certification Level :
Verified Supplier
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