Specifications
Brand Name :
GaNova
Model Number :
JDCD03-002-005
Certification :
UKAS/ISO9001:2015
Place of Origin :
Suzhou China
Payment Terms :
T/T
Delivery Time :
3-4 week days
Packaging Details :
Vacuum packing in a class 10000 clean room environment,in cassettes of 25pcs or single wafer containers.
Product Name :
Sic Epitaxial Wafer
Crystal form :
4H
Diameter :
150.0mm+0.0/-0.2mm
Surface orientation :
{0001}±0.2°
Length of main reference edge :
Notch
Length of secondary reference edge :
No sub-reference edges
Description

P-Level SI-Type 6inch 4H-SiC Semi insulating substrate 350.0±25.0μm MPD≤0.5/cm2 Resistivity≥1E9Ω·cm

6inch 4H-SiC substrate P-level SI-Type 350.0±25.0μm MPD≤0.5/cm2 Resistivity≥1E9Ω·cm for power and microwave devices

Overview

SiC has the following properties:

  • Wide Energy Bandgap
  • High electrical breakdown field
  • High saturation drift velocity
  • High thermal conductivity

SiC is used for the fabrication of very high-voltage and high-power devices such as diodes, power transistors, and high power microwave devices. Compared to conventional Si-devices, SiC-based power devices have faster switching speed higher voltages, lower parasitic resistances, smaller size, less cooling required due to high-temperature capability.

6inch 4H-SiC Semi insulating substrate

Product performance P D
Crystal form 4H
Polytypic Not allow Area≤5%
Micropipe Densitya ≤0.5/cm2 ≤5/cm2
Six square empty Not allow Area≤5%
Hexagon surface hybrid crystal Not allow
wrappage a Area≤0.05% N/A
Resistivity ≥1E9Ω·cm ≥1E5Ω·cm

(0004)XRD

Half height width of rocking curve(FWHM)

≤45 Arcsecond

N/A

Diameter 150.0mm+0.0/-0.2mm
Surface orientation {0001}±0.2°
Length of main reference edge Notch
Length of secondary reference edge No sub-reference edges
Notch orientation <1-100>±1°
Notch angle 90° +5°/-1°
Notch degree of depth From the edge 1mm +0.25mm/-0mm
surface preparation C-Face: Mirror Finish, Si-Face: Chemical Mechanical Polishing (CMP)
The edge of the wafer wafer edge chamfer

Surface roughness(10μm×10μm)

Si face Ra≤0.2 nm C-Face Ra≤0.5 nm

thickness

350.0μm±25.0μm

LTV(10mm×10mm)a

≤2µm

≤3µm

TTVa

≤6µm

≤10µm

Bowa

≤25µm

≤40µm

Warpa

≤40µm

≤60µm

Broken edge / gap Collapse edges of a length and a width of ≥0.5mm are not allowed ≤2 and each length and width of ≤1.0mm
scratcha ≤5And the total length is≤ 0.5 times the diameter ≤5 ,And the total length is≤1.5 times the diameter
flaw not allow
pollution not allow
Edge removal

3mm

Remark: 3mm edge exclusion is used for the items marked with a.

About Us

We specialize in processing a variety of materials into wafers, substrates and customized optical glass parts.components widely used in electronics, optics, opto electronics and many other fields. We also have been working closely with many domestic and oversea universities, research institutions and companies, provide customized products and services for their R&D projects. It's our vision to maintaining a good relationship of cooperation with our all customers by our good reputations.

FAQ

Q: Are you trading company or manufacturer ?
We are factory.
Q: How long is your delivery time?
Generally it is 3-5 days if the goods are in stock.
or it is 7-10 days if the goods are not in stock, it is according to quantity.
Q: Do you provide samples ? is it free or extra ?
Yes, we could offer the sample for free charge but do not pay the cost of freight.
Q: What is your terms of payment ?
Payment <=5000USD, 100% in advance.
Paymen >=5000USD, 80% T/T in advance , balance before shippment.

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P Level SI Type 6inch 4H SiC Semi Insulating Substrate 150mm

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Brand Name :
GaNova
Model Number :
JDCD03-002-005
Certification :
UKAS/ISO9001:2015
Place of Origin :
Suzhou China
Payment Terms :
T/T
Delivery Time :
3-4 week days
Contact Supplier
P Level SI Type 6inch 4H SiC Semi Insulating Substrate 150mm

Shanghai GaNova Electronic Information Co., Ltd.

Verified Supplier
3 Years
shanghai, shanghai
Since 2020
Business Type :
Manufacturer
Employee Number :
>100
Certification Level :
Verified Supplier
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