SiC substrate 4H-N thickness 350um used in optoelectronics semiconductor material
Product description
SiC substrates are key materials in the field of semiconductor technology, offering unique properties and promising applications. Silicon carbide (SiC) is a wide-bandgap semiconductor material known for its excellent electrical, thermal, and mechanical properties.
4H-N SiC substrates are typically n-type semiconductors, where nitrogen (N) dopants introduce excess electrons into the crystal lattice, making them suitable for applications requiring electron conduction. These substrates find applications in power electronics, high-frequency devices, and optoelectronics due to their high electron mobility and low on-resistance.
On the other hand, SiC substrates can also exhibit semi-insulating behavior, making them ideal for high-power and high-temperature applications. The semi-insulating properties arise from intrinsic defects or intentional doping with deep-level impurities, leading to a high resistivity and minimal electronic conduction. These substrates are widely used in high-power radiofrequency (RF) devices, microwave electronics, and harsh environment sensors.
The fabrication of high-quality SiC substrates involves advanced growth techniques such as physical vapor transport (PVT), chemical vapor deposition (CVD), or sublimation epitaxy. These techniques enable precise control over the material's crystal structure, purity, and dopant concentration, resulting in substrates with superior electrical and structural properties. The unique properties of SiC, combined with the precise fabrication processes, make SiC substrates highly valuable for a range of semiconductor applications.
Product parameter
Grade | Zero MPD Grade | Production Grade | Research Grade | Dummy Grade | |
Diameter | 150.0 mm +/- 0.2 mm | ||||
Thickness | 500 um +/- 25 um for 4H-SI350 um +/- 25 um for 4H-N | ||||
Wafer Orientation | On axis: <0001> +/- 0.5 deg for 4H-SIOff axis: 4.0 deg toward <11-20> +/-0.5 deg for 4H-N | ||||
Micropipe Density (MPD) | 1 cm-2 | 5 cm-2 | 15 cm-2 | 30 cm-2 | |
Doping Concentration | N-type: ~ 1E18/cm3SI-type (V-doped): ~ 5E18/cm3 | ||||
Primary Flat (N type) | {10-10} +/- 5.0 deg | ||||
Primary Flat Length (N type) | 47.5 mm +/- 2.0 mm | ||||
Notch (Semi-Insulating type) | Notch | ||||
Edge exclusion | 3 mm | ||||
TTV /Bow /Warp | 15um /40um /60um | ||||
Surface Roughness | Polish Ra 1 nm | ||||
CMP Ra 0.5 nm on the Si face |
Product nature
4H-N SiC substrates exhibit n-type conductivity due to the presence of nitrogen dopants, providing excess electrons for electronic conduction.
SiC substrates demonstrate semi-insulating behavior, characterized by high resistivity and minimal electronic conduction, which is essential for certain electronic and optoelectronic applications.
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Q&A
What is the difference between 4H-SiC and 6H-SiC?
All of the other SiC polytypes are a mixture of the zinc-blende and wurtzite bonding. 4H-SiC consists of an equal number of cubic and hexagonal bonds with a stacking sequences of ABCB. 6H-SiC is composed of two-thirds cubic bonds and one-third hexagonal bonds with a stacking sequences of ABCACB.