2 Inch Freestanding N-GaN Bulk GaN Substrates For LED,LD Or HEMT Structure
PAM-XIAMEN has established the manufacturing technology for freestanding (Gallium Nitride)GaN substrate wafer which is for UHB-LED and LD. Grown by hydride vapour phase epitaxy (HVPE) technology,Our GaN substrate has low defect density and less or free macro defect density.
PAM-XIAMEN offers full range of GaN and Related III-N Materials including GaN substrates of various orientations and electrical conductivity,crystallineGaN&AlN templates, and custom III-N epiwafers.
Here shows detail specification:
2inch Freestanding N-GaN GaN Substrates
Item | PAM-FS-GaN-50-N |
Dimension | 50.8 ±1 mm |
Thickness | 350 ±25 μm 430±25μm |
Orientation | C plane (0001) off angle toward M-axis 0.35 ±0.15° |
Orientation Flat | (1-100) 0 ±0.5°, 16 ±1 mm |
Secondary Orientation Flat | (11-20) 0 ±3°, 8 ±1 mm |
Conduction Type | N-type |
Resistivity (300K) | >106 Ω·cm |
TTV | < 0.05 Ω·cm |
BOW | -20 μm ≤ BOW ≤ 20 μm |
Surface Roughness: | Front side: Ra<0.2nm, epi-ready; Back side: Fine Ground or polished. |
Dislocation Density | From 1 x 105 to 5 x 10 6cm -2(calculated by CL)* |
Macro Defect Density | < 2 cm-2 |
Useable Area | > 90% (edge and macro defects exclusion) |
Package | each in single wafer container, under nitrogen atmosphere, packed in class 100 clean room |
2inch Freestanding N-GaN GaN Substrates
The growing demand for high-speed, high-temperature and high power-handling capabilities has made the semiconductor industry rethink the choice of materials used as semiconductors. For instance, as various faster and smaller computing devices arise, the use of silicon is making it difficult to sustain Moore’s Law. But also in power electronics, the properties of silicon are no longer sufficient to allow further improvements in conversion efficiency.
Due to its unique characteristics (high maximum current, high breakdown voltage, and high switching frequency), Gallium Nitride (or GaN) is the unique material of choice to solve energy problems of the future. GaN based systems have higher power efficiency, thus reducing power losses, switch at higher frequency, thus reducing size and weight.
Transmitance-GaN material-TEST REPORT
A test report is necessary to show the compliance between custom description and our final wafers data. We will test the wafer characerization by equipment before shipment, testing surface roughness by atomic force microscope, type by Roman spectra instrument, resistivity by non-contact resistivity testing equipment,micropipe density by polarizing microscope, orientation by X-ray Orientator etc. if the wafers meet the requirement, we will clean and pack them in 100 class clean room, if the wafers do not match the custom spec, we will take it off.
The transmittance of the wafer surface is the effectiveness of its transmission of radiative energy. Compared with the transmission coefficient, it is the fraction of the incident electromagnetic power transmitted through the sample, and the transmission coefficient is the ratio of the transmitted electric field to the incident electric field.
Transmitance of GaN material