High purity Gold Sputtering Target 99.999% for Magnetron Sputtering Coating

A gold sputtering target is a disc-shaped material made of high-purity gold metal and is used in a process called sputtering. In sputtering, a target material is bombarded with plasma ions, which knock off atoms from the target surface and deposit them onto a substrate to create a thin film.

Features :

High purity: Gold sputtering targets are made from high-purity gold metal, typically 99.99% or higher, to ensure the highest quality and consistency of the deposited thin film.

Customizable size and shape: Gold sputtering targets are available in various sizes and shapes, including round, rectangular, and annular, to meet specific requirements of the sputtering process.

Good thermal and electrical conductivity: Gold sputtering targets have excellent thermal and electrical conductivity, making them suitable for a range of applications.

High melting point: Gold has a relatively low melting point of 1064°C, making it suitable for low-temperature sputtering applications.

Applications :

Semiconductor industry: Gold sputtering targets are used in the semiconductor industry to deposit thin films of gold and gold-based materials for integrated circuits, microprocessors, and other electronic components.

Optics industry: Gold sputtering targets are used in the optics industry to deposit thin films of gold for mirrors, filters, and other optical components.

Decorative coatings: Gold sputtering targets are used to deposit thin films of gold for decorative coatings on jewelry, watches, and other luxury items.

Medical devices: Gold sputtering targets are used in the production of medical devices, including implants and diagnostic sensors, due to gold's biocompatibility and electrical conductivity.

Aerospace industry: Gold sputtering targets are used in the aerospace industry to deposit coatings on spacecraft and satellites to improve their performance and durability.

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