99.95% High purity Mo1 molybdenum special parts molybdenum sputtering target
Molybdenum sputtering targets are a type of material used in the process of sputtering, which is used to deposit thin films of materials onto a substrate. Sputtering is a process in which atoms from the target material are ejected and deposited onto a substrate, creating a thin film.
Molybdenum sputtering targets are made from high-purity molybdenum and are used in a variety of applications, including semiconductor manufacturing, aerospace, and medical industries. Some of the features and applications of molybdenum sputtering targets include:
High melting point: Molybdenum has a very high melting point, which makes it an ideal choice for applications that require high-temperature resistance.
High density: Molybdenum is a very dense material, which makes it an excellent choice for applications that require a high mass deposition rate.
Good thermal conductivity: Molybdenum has good thermal conductivity, which makes it useful for applications that require efficient heat dissipation.
Corrosion resistance: Molybdenum is highly resistant to corrosion, making it an excellent choice for applications that require a durable coating.
High purity: Molybdenum sputtering targets are made from high-purity molybdenum, which makes them suitable for applications that require a high level of purity, such as semiconductor manufacturing.
Overall, molybdenum sputtering targets are a high-quality material that is well-suited for a wide range of applications that require a highly stable, corrosion-resistant, and thermally conductive coating.