Ultrasonic Cleaning Equipment For Silicon Wafer And Optical Lens Ultrasonic Cleaning Machine
Model | CL-10800 |
Voluem | 960L |
Ultrasonic power | 10.8kw |
Heating power | 30kw |
Tank size | 1500*800*800mm |
Overall size | 1700*1280*1150mm |
Frequency | 40/28KHz |
Weight | 500kg |
Ultrasonic concept: When the pressure or intensity of sound pressure reaches a certain point, the bubble will expand rapidly and then suddenly close. In this process, the shock wave is generated at the moment of bubble closure, resulting in 1012-1013pa pressure and local temperature regulation around the bubble. The huge pressure generated by such ultrasonic cavitation can destroy insoluble dirt and make them differentiate into solution. Steam cavitation directly and repeatedly impacts dirt.