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CVD Furnace Deposition Equipment for Semiconductor Material Preparation Thin Film
CVD Furnace Deposition Equipment for Semiconductor Material Preparation Thin Film
Specifications
Packaging Details :
wooden case packing
Supply Ability :
30 Piece/Pieces per Quarter
Brand Name :
Jingtan
Certification :
CE
MOQ :
1 set
Delivery Time :
60 days
place of origin :
Hunan, China
type :
Induction Furnace
usage :
deposition furnace
video outgoing-inspection :
Provided
machinery test report :
Provided
core components :
PLC
brand name :
Jingtan
voltage :
380
weight (t) :
2 T
power (kw) :
220
key selling points :
Competitive Price
Design Temperature (℃) :
1250-2200
Woring temperature :
900-1200℃
Pressure rise rate (Pa/h) :
0.67Pa/h(150Pa/24h)
Heating method :
Resistance/induction
Working atmosphere :
vacuum/CH4/C3H6/H2/N2/Ar
Furnace type :
Square/roundVertical/Horizontal
Furnace cooling mode :
furnace shell water cooling
Infrared instrument :
single/double colorimetric
Temperature uniformity :
±5
Limit vacuum Degree(Pa) :
1-100
Marketing Type :
Ordinary Product
Warranty of core components :
1 Year
Applicable Industries :
Other, semiconductor
Description
Specification:
CVD Furnace Deposition Equipment for Semiconductor Material Preparation Thin FilmCVD Furnace Deposition Equipment for Semiconductor Material Preparation Thin Film
Vacuum deposition furnace:
Mainly used for the preparation of carbon-carbon composite materials, and the deposition furnace is mainly used for the preparation of pyrolytic carbon coating on the surface of graphite, semiconductor devices and heat-resistant scour materials.
Parameter /Model No.
JT-0305-C
JT-0505-C
JT-0608-C
JT-0608-C
JT-0812-C
JT-1120-C
JT-1218-C
JT-1520-C
Working Zone Size
φ×H(mm)
300×500
500×500
600×800
600×1200
800×1200
1100×2000
1200×1800
1500×2000
Highest Temperature
(℃)
2300
2300
2300
2300
2300
2300
2300
2300
Temperature uniformity(℃)
±5
±5
±5/±7.5
±7.5/±10
±7.5/±10
±10/±15
±10/±15
±15/±20
Limit Vacuum Degree(Pa)
1-100
1-100
1-100
1-100
1-100
1-100
1-100
1-100
Limit Vacuum Degree(Pa)
0.67
0.67
0.67
0.67
0.67
0.67
0.67
0.67
Heating method
Resistance/induction
Resistance/induction
Resistance/induction
Resistance/induction
Resistance/induction
Resistance/induction
Resistance/induction
Resistance/induction
CVD Furnace Deposition Equipment for Semiconductor Material Preparation Thin Film
Design temperature
1250℃/1650℃/1800℃/2200℃
Common temperature
900~1200℃
Vacuum degree
< 50Pa
Pressure rise rate
6.67pA /h(or 150Pa/24h) in cold state of empty furnace
Heating mode
graphite resistance heating or induction heating, independent temperature control, good temperature uniformity
Atmosphere medium
vacuum /CH4/C3H6/H2/N2/Ar
CVD Furnace Deposition Equipment for Semiconductor Material Preparation Thin Film
Gas control mode
mass flow meter control, multi-channel gas path, uniform flow field, no deposition dead Angle, good deposition effect;Multi-stage and efficient exhaust treatment system, environmentally friendly, easy to clean up
Furnace type
square, round, vertical or horizontal structure (non-standard design), fully enclosed deposition chamber, good sealing effect,
strong anti-pollution ability;
Furnace cooling mode
furnace shell water cooling, external circulation quick cooling system can be selected, short cooling time, high production
efficiency;
CVD Furnace Deposition Equipment for Semiconductor Material Preparation Thin Film
Structure form
horizontal - side discharge, vertical - up/down discharge
Locking mode
manual/automatic
Shell material
inner stainless steel/all stainless steel
Insulation material
carbon felt/graphite felt/carbon fiber cured felt
Infrared instrument
single colorimetric/double colorimetric
Power supply
KGPS/IGBT(only suitable for medium frequency heating)
Product parameter:
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CVD Furnace Deposition Equipment for Semiconductor Material Preparation Thin Film

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Product Detail
Packaging Details :
wooden case packing
Supply Ability :
30 Piece/Pieces per Quarter
Brand Name :
Jingtan
Certification :
CE
MOQ :
1 set
Delivery Time :
60 days
Contact Supplier
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CVD Furnace Deposition Equipment for Semiconductor Material Preparation Thin Film

Hunan Jingtan Automation Equipment Co., LTD.

Verified Supplier
1 Years
hunan, zhuzhou
Since 2021
Business Type :
Manufacturer, Exporter
Main Products :
Graphitization Furnace, Sintering Furnace, Continuous Furnace
Total Annual :
2million -5million
Employee Number :
40~60
Certification Level :
Verified Supplier
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