Wondery Customized Vacuum Gas Nitirding Furnace Heat Treat Overs

1.Characteristics of ion nitriding process:

Ion nitriding is a chemical heat treatment process. In a low vacuum nitrogenous atmosphere, with the furnace body as the anode and the workpiece to be treated as the cathode, a DC voltage of hundreds of volts is applied between the anode and cathode to make the glow discharge nitriding produced by the process. Ion nitriding has many names, such as ion nitriding, glow discharge nitriding, ion bombardment nitriding, plasma nitriding, etc. The equipment that carries out this ion nitriding process is called plasma nitriding furnace, heat treatment nitriding furnace or plasma ion nitriding furnace.

2.What are the technical characteristics of ion nitriding?

2.1 The unique characteristics of ion nitriding technology are ion bombardment, sputtering cleaning and plasma activation. Ion activation is the fundamental guarantee for the formation of high-quality nitriding layer, and activation diffusion runs through the whole process of ion nitriding. Ions activate and decompose NH3, N2 and H2 atoms to produce active ions. At the same time, the ion activation of the workpiece surface produces a large number of micro defects and activated surfaces, which react with the activated surface to form a nitride layer on the activated surface. Therefore, it is very important to control and adjust the ion activation conditions. It is of great significance to study the bombardment heating, sputtering reaction and activation effect of glow discharge for the development and improvement of ion nitriding furnaces.

2.2 We studied the process of compound layer formed by ion nitriding furnaces, and found that the phase structure of compound layer produced by ion nitriding and gas nitriding is different, because the mechanism of compound layer formation is different. The ion nitriding compound layer of 38CrMoAl Steel is composed of phases, mainly phases, with about 25 phases on the surface, while the gas nitriding compound layer is composed of phases, and the surface does not contain phases. If the sample is activated by argon ion sputtering for 4H in advance, and then ion nitridation is carried out at 5506h, the surface phase is reduced from 55 to 45, the surface phase is increased from 25 to 42, and the phase is reduced from 20 to 13. It can be seen that the samples activated by ion sputtering increase the number of phases in the surface compound layer and reduce the formation of phases during nitriding.

3.Technical Parameters