Laser Radiation Monitoring System NOVA II
Standard:Confirm to IEC60950,IEC60825-2,IEC60825-12.
Application:Used to measure the laser wavelength, aperture, power generated by laser or LED.
Test sample:Laser or LED components.
Parameters:
OPHIR Laser power meter probe PD300R-3W | ||||
Detector Type | silicon | |||
Aperture | φ10mm | |||
Filter mode | Filter out | Filter in | ||
Spectral Range nm | 350-1100 | 430-1100 | ||
Power Range | 100mW to5nW | 100mW to5nW | ||
Power Scales | 100mW to 300nW and dBm | 3W to 30mW and dBm | ||
Resolution nW | 0.1 | NA | ||
Maximum Power vs. Wavelength |
nm | mW | mW | |
<488 | 100 | 3000 | ||
633 | 100 | 3000 | ||
670 | 100 | 2000 | ||
790 | 100 | 1200 | ||
904 | 100 | 1200 | ||
1064 | 100 | 2200 | ||
Accuracy (including errors due to temp. variations) | ||||
% error vs Wavelength nm | ±10 360-400 | NA | ||
±3 400-950 | ±5 430-950 | |||
±5 950-1100 | ±7 950-1100 | |||
Damage Threshold W/cm2 | 10 | 100 | ||
Max Pulse Energy μJ | 20 | 500 | ||
Noise Level for filter out pW | 200 | |||
Response Time with Meter s | 0.2 | |||
Beam Position Dependence | ±2% | ±3% | ||
Fiber Adapters Available (see page 63) | FC, ST, SC, SMA |
About Us
Shanghai kerang technology co., ltd is located in Shanghai City, China, and was established in 2018.It is a company specializing in the field of automation technology: technology development, technology transfer, technical consultation and technical service; installation, design, commissioning and maintenance of automation equipment; and other high-tech enterprises. And have strong R & D capabilities in the field of test instrument industry. The testing equipment developed by the company is widely used in many industries such as electronics, home appliances, etc.
We have strong technical reserves and solid technical strength, especially in the field of environmental testing equipment or product online monitoring. The newly developed products are used in aerospace, aerospace, nuclear industry and other projects.
Looking forward to your inquiry and negotiation.