high quality titanium target GR2 GR5 titanium alloy Ti6Al4V

The word "target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target".

From metal titanium to titanium sputtering target

Titanium sputtering target is a titanium product made of titanium metal as raw material, which is used to produce titanium film by sputtering. In brief, there are two methods to manufacture titanium sputtering target with metal titanium casting method and powder metallurgy method.

Casting: Melt the raw materials with a certain proportion, pour the alloy solution into the mold to form ingots, and finally machine them into sputtering targets. The method is melting and casting in vacuum.

Powder metallurgy: Melt the raw materials with a certain proportion, cast them into ingots, crush them, isostatic press the powder, and then sinter them at high temperature to make targets.

Product name: Titanium target sputtering

Material: Pure titanium: GR1 GR2

Purity >= 99.6%

Application:Hardware, decoration, tools, ceramics, golf and other coating industries.

Dimension:

Round sputtering target: Φ100×40, Φ95×45, Φ80×40, Φ90×40, Φ85×35 and other specific sizes.

Tube sputtering target: Φ70×7×L900--2000mm, Φ89.4mmX7.62mmX1728mm,Φ89.4mmX15mmX1728mm, Φ80mmX10mmX1728mm, and other specific sizes.

Plate sputtering target: T6-40×W60--800×L600--2000mm and other specific sizes.

We can customize alloy targets in different proportions according to customer needs

Detailed images:

Material:

1) Ti/Al alloy target (67:33,50:50at%)

2) W/Ti alloy target (90:10wt%),

3) Ni/V alloy target (93:7, wt%)

4) Ni/Cr alloy target (80:20, 70:30, wt%),

5) Al/Cr alloy target (70:30,50:50at%)

6) Nb/Zr alloy target (97:3,90:10wt%)

7) Si/Al alloy target (90:10, 95:5, 98:2, 70:30, wt%)

8) Zn/Al alloy target

9) High purity chromium target (99.95%, 99.995%)

10) Al/Cr alloy target (70:30, 50:50, 67:33, at%)

11) Ni/Cu alloy target (70:30, 80:20, wt%)

12) Al/Nd alloy target (98:2wt%)

13) Mo/Nb alloy target (90:10, wt%)

14) TiAlSi alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)

15)CrAlSi alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)