Ti Titanium Sputtering Target High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine
In the realm of advanced materials, titanium sputtering targets are pivotal in the production of high-performance coatings used in various applications, from aerospace to medical devices. Among these, the titanium alloys Gr1, Gr2, and Gr5, as well as TiAl (Titanium-Aluminum) alloys, have emerged as essential components for Physical Vapor Deposition (PVD) coatings. These targets are designed to meet the specific needs of different industries by providing superior mechanical properties, corrosion resistance, and wear resistance. This article delves into the characteristics and applications of these titanium sputtering targets, focusing on their significance in PVD coating processes.
Product name | Titanium Sputtering Targets for pvd coating machine |
Grade | Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc Other materials:chrome,zirconium,copper ,tungsten etc. |
Origin | Baoji city, Shaanxi Province,hina |
Titanium content | ≥99.5 (%) |
Impurity content | <0.04(%) |
Density | 4.51 or 4.50 g/cm3 |
Standard | ASTM B348 , ASTM B381 |
Size | 1. Round target: Ø30--2000mm, thickness 3.0mm--300mm; 2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm 3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm 4. Customized is available |
Technique | Forged and CNC Machined |
Application | Semiconductor separation, Film coating materials, Storage Electrode coating, Sputtering coating, Surface coating, Glass coating industry. |
Basic requirements for titanium sputtering targets:
In general, the following indicators will be considered when measuring whether the sputtering target meets the main requirements:
Purity: Purity has a great influence on the performance of the sputtered film. Take titanium target as an example, the higher the purity, the better the corrosion resistance, electrical and optical properties of the sputtered film.
Impurity content: impurities in the target solid and oxygen and water vapor in the pores are the main pollution sources of the deposition film. Different target materials have different requirements for their impurity content.
Density: The density of the target will not only affect the sputtering rate, but also affect the electrical and optical properties of the film. Therefore, in order to reduce the porosity in the target solid and improve the performance of the sputtered film, the target is usually required to have a high density.
Grain size and grain distribution: for the same target, the sputtering rate of fine grain target is faster than that of coarse grain target; The smaller the particle size difference (uniform distribution), the more uniform the thickness of the target sputtering deposition film.
Titanium is classified into various grades based on its composition and properties. Grade 1 (Gr1) is commercially pure titanium, known for its excellent corrosion resistance and high ductility. Grade 2 (Gr2) is also commercially pure but with slightly higher strength, making it suitable for a broader range of applications. Grade 5 (Gr5), also known as Ti-6Al-4V, is an alloy containing aluminum and vanadium, offering superior strength-to-weight ratios, making it ideal for applications that demand high performance under stress.
TiAl alloys, which combine titanium with aluminum, provide enhanced hardness and thermal stability. This makes them particularly valuable for coatings that require excellent wear resistance and performance at elevated temperatures. The unique properties of these titanium grades and alloys make them favorable choices for various PVD applications, where the quality of the coating directly impacts the performance of the final product.
Sputtering targets are materials that are bombarded by high-speed charged particles during the PVD coating process. When these particles strike the target, atoms are ejected from its surface and deposited onto a substrate, forming a thin film. The choice of target material directly influences the properties of the resulting film, allowing for the customization of coatings to meet specific requirements. By selecting different target materials, such as aluminum, copper, or titanium alloys, manufacturers can produce films with varying characteristics, including super-hardness, wear resistance, and anti-corrosive properties.
In the case of titanium sputtering targets, the ability to produce films that exhibit superior adhesion, low friction, and high hardness is particularly beneficial. These properties are crucial for applications in industries such as aerospace, automotive, and medical technology, where components are subjected to extreme conditions and must maintain integrity over time. By utilizing Gr1, Gr2, Gr5, and TiAl titanium targets, manufacturers can achieve coatings that enhance the performance and longevity of critical components.
The advantages of using Gr1, Gr2, Gr5, and TiAl titanium sputtering targets are manifold. For starters, the high corrosion resistance of Gr1 and Gr2 makes them suitable for environments that expose materials to aggressive chemicals or seawater. These grades ensure that the coatings maintain their integrity, providing long-lasting protection for underlying substrates.
Gr5 titanium targets, with their exceptional strength, are ideal for high-stress applications, such as in aerospace components where weight savings are critical. The TiAl alloys, on the other hand, excel in high-temperature applications, offering thermal stability that prevents degradation during prolonged exposure to heat. The combination of these advantages allows manufacturers to tailor their coatings to specific operational demands, ensuring that the final products perform optimally in their intended environments.
Sputtering is a deposition technique used to create thin films on various substrates. The process involves bombarding a target material with energetic particles, typically ions, which eject atoms from the target's surface. These ejected atoms then deposit onto a substrate, forming a thin film. Sputtering is favored in medical applications for its ability to produce uniform coatings with precise control over thickness and composition.
Metal targets, including titanium, are particularly valuable in the medical sector due to their favorable mechanical properties, corrosion resistance, and biocompatibility. Titanium, in particular, is widely used for medical applications because of its strength-to-weight ratio and ability to integrate seamlessly with human tissue.
Titanium is an exceptional material in the medical field, primarily due to its biocompatibility. It does not provoke significant immune responses, making it ideal for long-term implants such as orthopedic prosthetics and dental fixtures. Additionally, titanium's corrosion resistance ensures that it maintains its integrity in the harsh environments often found within the human body.
When used as a sputtering target, titanium can be customized to meet specific requirements for various medical devices. This customization involves adjusting parameters such as purity levels, grain structure, and compactness of the target material, which directly influences the properties of the deposited films.
Customized titanium sputtering targets are used in a variety of medical applications, including:
Orthopedic Implants: Titanium coatings enhance the surface properties of orthopedic devices, improving biocompatibility and reducing wear. This is crucial for implants that endure significant mechanical loads.
Dental Implants: Sputtered titanium coatings improve the osseointegration of dental implants, promoting better bonding with surrounding bone tissue.
Surgical Instruments: Coatings applied through sputtering can enhance the hardness and corrosion resistance of surgical tools, prolonging their lifespan and maintaining their performance through repeated sterilization cycles.
Drug Delivery Systems: Innovative sputtering techniques allow for the development of ultrathin films that can facilitate controlled drug release, improving treatment efficacy.
As the medical industry continues to evolve, the role of sputtering technology is becoming increasingly significant. Ongoing research into advanced materials and deposition techniques promises to unlock new possibilities for medical applications. For instance, incorporating nanotechnology into sputtering processes can lead to the development of multifunctional coatings that combine antimicrobial properties with enhanced mechanical strength.
Moreover, the growing emphasis on personalized medicine is driving the demand for customized sputtering targets tailored to individual patient needs. Manufacturers are investing in advanced production methods to create sputtering targets that meet these specific requirements, ensuring that medical devices can provide optimal outcomes.
Titanium, especially Grade 1 and Grade 2, is highly regarded in medical and biomedical fields for its biocompatibility, strength, and lightweight characteristics. It's commonly used in medical devices because it is not harmful to the body and is not likely to cause allergic reactions.
Chemical requirements | |||||||||||
N | C | H | Fe | O | Al | V | Pd | Mo | Ni | Ti | |
Gr1 | 0.03 | 0.08 | 0.015 | 0.20 | 0.18 | / | / | / | / | / | bal |
Gr2 | 0.03 | 0.08 | 0.015 | 0.30 | 0.25 | / | / | / | / | / | bal |
Gr5 | 0.05 | 0.08 | 0.015 | 0.40 | 0.20 | 5.5~6.75 | 3.5~4.5 | / | / | / | bal |
Gr7 | 0.03 | 0.08 | 0.015 | 0.30 | 0.25 | / | / | 0.12~0.25 | / | / | bal |
Gr12 | 0.03 | 0.08 | 0.015 | 0.30 | 0.25 | / | / | / | 0.2~0.4 | 0.6~0.9 | bal |
Packaging: Each titanium target is packed in a customized vacuum plastic bag, filled with foam film and pearl cotton in the middle, and a fumigation-free plywood case outside. Comply with international transportation standards, to ensure that the goods are safe in transportation.
About our company:
Titanium alloy sputtering targets, including TiAl alloys, are versatile materials widely used for coating applications in industries ranging from aerospace to electronics and biomedical. These materials provide exceptional properties such as strength, corrosion resistance, biocompatibility, and wear resistance, making them ideal for demanding applications that require durable, high-performance thin films. When choosing a titanium sputtering target, factors like alloy composition, purity, and target geometry must be considered to achieve optimal results in the sputtering process.