Titanium Material Targets Disk Titanium Discs Grade 1 Grade 2 Titanium Alloy for Coating
Titanium Alloy Targets / Titanium Sputtering Targets / TiAl Alloy Target for Coating are essential materials in the physical vapor deposition (PVD) process, specifically used in sputtering to create thin coatings on various substrates. These targets are typically made from titanium (Ti) or titanium alloy (such as TiAl for titanium-aluminum alloys), which are sputtered in a vacuum chamber onto surfaces to form thin films. These coatings have a wide range of applications, from aerospace to electronics and decorative finishes.
In the sputtering process, a target is bombarded with energetic ions (typically argon ions) in a vacuum chamber. This causes atoms from the target material to be ejected or "sputtered" onto a substrate (such as a metal, glass, or plastic), forming a thin coating or film. Titanium alloy targets and titanium sputtering targets are commonly used in this process for various purposes.
Titanium (Ti) Targets:
Titanium-Aluminum (TiAl) Alloy Targets:
Aerospace:
Semiconductors and Electronics:
Decorative Coatings:
Wear-Resistant Coatings:
Biomedical Applications:
Energy:
Optical Coatings:
Superior Strength-to-Weight Ratio:
Corrosion Resistance:
Wear Resistance:
Biocompatibility:
High Temperature Resistance:
Purity: High-purity titanium targets are often required for high-performance applications, ensuring uniformity in the sputtered film and minimizing impurities.
Density and Porosity: The target's density and porosity can affect sputtering efficiency. High-density targets are preferred for consistent and high-quality coatings.
Target Geometry: Sputtering targets are typically manufactured in various shapes such as circular, rectangular, or customized based on specific sputtering systems. The choice of geometry can impact the sputtering yield and film uniformity.
Alloy Composition: For TiAl and other titanium alloys, the precise control of the alloy's composition (e.g., the percentage of aluminum in TiAl) is critical for ensuring that the sputtered film retains the desired properties, such as hardness, wear resistance, and thermal stability.
Technical Parameters | Description |
---|---|
Product Name | Titanium Disc |
Material | Titanium Alloy |
Shape | Round |
Thickness | 35mm-550mm Or As Your Requirement |
Diameter | 150mm-1300mm Or As Your Requirement |
Color | Silver |
Surface Treatment | Polished |
Application | Industrial |
Package | Plywood Case Or According to Your Requirement |
Titanium discs with diameters ranging from 35mm to 550mm can be produced for various purposes, such as plates, sheets, blanks, or cutting components. The specific diameter range you mentioned indicates that these discs can be used in larger applications, such as in the aerospace, automotive, or medical fields.
Corrosion Resistance: Titanium is known for its outstanding corrosion resistance, especially in marine environments, medical implants, and chemical processing.
High Strength-to-Weight Ratio: Titanium alloys are much stronger than pure metals like aluminum, yet are extremely lightweight. This combination is ideal for aerospace and high-performance applications.
Biocompatibility: Titanium, especially Gr2, is widely used in the medical field due to its biocompatibility, reducing the risk of immune rejection in implants and surgical components.
Customizable Sizes: Titanium discs can be produced in various diameters and thicknesses (35mm to 550mm), making them versatile for different industrial applications. These discs can be further processed (cut, drilled, welded) to meet specific requirements.
Fatigue Resistance: Titanium alloys, especially when combined with aluminum, offer excellent fatigue resistance, making them perfect for applications where parts experience repetitive loading, such as in aerospace and automotive industries.
Chemical requirements | |||||||||||
N | C | H | Fe | O | Al | V | Pd | Mo | Ni | Ti | |
Gr1 | 0.03 | 0.08 | 0.015 | 0.20 | 0.18 | / | / | / | / | / | bal |
Gr2 | 0.03 | 0.08 | 0.015 | 0.30 | 0.25 | / | / | / | / | / | bal |
Gr5 | 0.05 | 0.08 | 0.015 | 0.40 | 0.20 | 5.5~6.75 | 3.5~4.5 | / | / | / | bal |
Gr7 | 0.03 | 0.08 | 0.015 | 0.30 | 0.25 | / | / | 0.12~0.25 | / | / | bal |
Gr12 | 0.03 | 0.08 | 0.015 | 0.30 | 0.25 | / | / | / | 0.2~0.4 | 0.6~0.9 | bal |
Tensile requirements | |||||
Grade | Tensile srength(min) | Yeild strength(mm) | Elongation(%) | ||
KSI | MPa | Ksi | MPa | ||
1 | 35 | 240 | 20 | 138 | 24 |
2 | 50 | 345 | 40 | 275 | 20 |
5 | 130 | 895 | 120 | 828 | 10 |
7 | 50 | 345 | 40 | 275 | 20 |
12 | 70 | 438 | 50 | 345 | 18 |
Titanium alloy sputtering targets, including TiAl alloys, are versatile materials widely used for coating applications in industries ranging from aerospace to electronics and biomedical. These materials provide exceptional properties such as strength, corrosion resistance, biocompatibility, and wear resistance, making them ideal for demanding applications that require durable, high-performance thin films. When choosing a titanium sputtering target, factors like alloy composition, purity, and target geometry must be considered to achieve optimal results in the sputtering process.