Specifications
Brand Name :
PRM
Model Number :
custom
Certification :
ISO9001
Place of Origin :
China
MOQ :
1pc
Price :
Negotiate
Payment Terms :
T/T, L/C
Supply Ability :
5000kgs/month
Delivery Time :
7~10 work days
Packaging Details :
Plywood case
Name :
Tantalum sputter coating target
Grade :
RO5200,RO5400,RO5252,RO5255,Ta1,Ta2
Purity :
99.95% 99.99%
Shape :
Disc & Plate
Size :
As per customer's drawing
Density :
16.75g/cm3
Description

High Purity Sputter Coating Tantalum Target Tantalum Disc Target

1. Specifications Of Sputter Coating Tantalum Target:

Sputter Coating Tantalum Target

Material: R05200, R05400, R05252 (Ta-2.5W), R05255 (Ta-10W)

Circular targets: Dia 25mm ~ 400mm x Thickness 3mm ~ 28mm

Rectangular targets: Thickness 1mm ~ 12.7mm x Width < 600mmx Length < 2000mm

Purity: >=99.95% or 99.99%

Surface: bright,polished

Condition: annealed

We can also process according to your request.

Grade 3N, 3N5, 4N, with Ta 99.99%min
Recrystallization 95%min
Grain size ASTM 4 or finer
Surface finish 16Rms max. or Ra 0.4 ( RMS64 or better)
Flatness 0.1mm or 0.15% max
Tolerance +/-0.010" on all dimensions

High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999%High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999%

2. Chemical Composition Of Sputter Coating Tantalum Target:

Grade Element content(wt%)
C N O H Fe Si Ni Ti Mo W Nb Ta
Ta1 0.01 0.005 0.015 0.0015 0.005 0.005 0.002 0.002 0.01 0.01 0.05 Remain
Ta2 0.02 0.025 0.03 0.005 0.03 0.02 0.005 0.005 0.03 0.04 0.1 Remain
TaNb3 0.02 0.025 0.03 0.005 0.03 0.03 0.005 0.005 0.03 0.04 1.5~3.5 Remain
TaNb20 0.02 0.025 0.03 0.005 0.03 0.03 0.005 0.005 0.02 0.04 17~23 Remain
TaNb40 0.01 0.01 0.02 0.0015 0.01 0.005 0.01 0.01 0.02 0.05 35~42 Remain
TaW2.5 0.01 0.01 0.015 0.0015 0.01 0.005 0.01 0.01 0.02 2.0~3.5 0.5 Remain
TaW7.5 0.01 0.01 0.015 0.0015 0.01 0.005 0.01 0.01 0.02 6.5~8.5 0.5 Remain
TaW10 0.01 0.01 0.015 0.0015 0.01 0.005 0.01 0.01 0.02 9.0~11 0.1 Remain

3. Application Of Sputter Coating Tantalum Target:

Tantalum sputtering target is a tantalum sheet obtained through pressure processing. It has high chemical purity, small grain size, recrystallized structure and good consistency in three axes. It is mainly used in optical fibers, semiconductor wafers and integrated circuits. For sputter deposition coatings, tantalum targets can be used for cathode sputtering coatings, high vacuum getter active materials, etc., and are important materials for thin film technology.

4. Advantage of our Sputter Coating target:


- polised surface with high quality.
- uniform grain with densified microstructure ensures longer use time.

- professional after-sales service.


Do you want to know more about our products?

High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999%

High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999%

Send your message to this supplier
Send Now

High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999%

Ask Latest Price
Brand Name :
PRM
Model Number :
custom
Certification :
ISO9001
Place of Origin :
China
MOQ :
1pc
Price :
Negotiate
Contact Supplier
High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999%
High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999%
High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999%
High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999%
High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999%

Shaanxi Peakrise Metal Co.,Ltd

Site Member
3 Years
Shaanxi, baoji
Since 2010
Business Type :
Manufacturer, Exporter
Total Annual :
1000000-5000000
Employee Number :
20~50
Certification Level :
Site Member
Contact Supplier
Submit Requirement