Product Information:
Name | Tantalum Disc /Tantalum Round Plate |
Grade | Ta1 Ta2 RO5200 RO5400 RO5252 RO5255 |
Purity | ≥99.95% |
Size | 0.2~50mm thickness 10~600mm diameter |
Surface | Machined surface, no pits, scratches, stains, burrs and other defects |
Standard | ASTM B708 |
Application | Mainly used in sputtering deposition coatings of optical fibers, semiconductor wafers and integrated circuits. |
Chemical Content of Tantalum Disc
Grade | Main elements | Impurity content less than % | |||||||||||
Ta | Nb | Fe | Si | Ni | W | Mo | Ti | Nb | O | C | H | N | |
Ta1 | Remain | —— | 0.005 | 0.005 | 0.002 | 0.01 | 0.01 | 0.002 | 0.04 | 0.02 | 0.01 | 0.0015 | 0.01 |
Ta2 | Remain | —— | 0.03 | 0.02 | 0.005 | 0.04 | 0.03 | 0.005 | 0.1 | 0.03 | 0.01 | 0.0015 | 0.01 |
TaNb3 | Remain | <3.5 | 0.03 | 0.03 | 0.005 | 0.04 | 0.03 | 0.005 | —— | 0.03 | 0.01 | 0.0015 | 0.01 |
TaNb20 | Remain | 17.0~23.0 | 0.03 | 0.03 | 0.005 | 0.04 | 0.03 | 0.005 | —— | 0.03 | 0.01 | 0.0015 | 0.01 |
Ta2.5W | Remain | 0.005 | 0.005 | 0.002 | 3 | 0.01 | 0.002 | 0.04 | 0.02 | 0.01 | 0.0015 | 0.01 | |
Ta10W | Remain | 0.005 | 0.005 | 0.002 | 11 | 0.01 | 0.002 | 0.04 | 0.02 | 0.01 | 0.0015 | 0.01 |
Application:
Tantalum disc are mostly used as sputtering targets. They have high chemical purity, small grain size, good recrystallization structure and three-axis consistency. They are mainly used in sputtering deposition coatings of optical fibers, semiconductor wafers and integrated circuits. Tantalum Target materials can be used for cathode sputtering coatings, high vacuum getter active materials, etc., and are important thin film technology materials.
We can process other shape and size tantalum products,pls send us an inquiry for more information.