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Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace
Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace
Specifications
Brand Name :
Brother Furnace
Model Number :
BR-PECVD
Certification :
CE
Place of Origin :
China
MOQ :
1 Set
Price :
Negotiation
Payment Terms :
L/C, T/T, Western Union
Supply Ability :
200 Sets per month
Delivery Time :
7-21 Working days
Packaging Details :
Strong wooden box for global shipping
Max Temperature :
1200℃
Normal vacuum :
-0.1MPa
Max Vacuum :
Configuration molecular pump, Vacuum 7x10-4 Pa (Optional)
Flange :
304 stainless steel sealing flange
Over-temperature protection :
automatic power-off when the temperature exceeds the allowable set value
Safety protection :
Automatically power off when the furnace body leaks
Furnace structure :
double layer steel dual cooling fan, surface temperature below 50℃
Max Heating rate :
20°C /min
TEMPERATURE ACCURACY :
±1℃
TEMPERATURE UNIFORMITY :
±5℃
Temperature Control :
50 Segments programmable and auto control
Furnace tube :
Quartz tube
Application :
Plasma Enhanced Chemical Vapor Deposition Furnace
Description

Lab Plasma Enhanced Chemical Vapor Deposition Furnace up to 1200 Degree

Intelligent PECVD Introduction:
PECVD system is designed to decrease the reaction temperature of traditional CVD. It installed RF induction equipment in front of traditional CVD to ionize reacting gas, so the plasma is generated. Plasma's high activity is Reaction is accelerated due to the high activity of plasma. So, this system is called PECVD.
This model is the newest product, it synthesized the advantages of most tube PECVD systems, and added a pre-heating zone in the front of the PECVD system. Tests showed that the deposition speed is quicker, the film quality is better, holes are less, and won't crack. AISO fully automatic intelligent control system is independently designed by our company, it is more convenient to operate and its function is more powerful.
Wide application range: metal film, ceramic film, composite film, the continuous growth of various films. Easy to increase function, can expand plasma cleaning etch and other functions


Main Feature:

  • High film deposition rate: RF glow technology, greatly increasing the deposition rate of the film, the deposition rate can reach 10Å / S
  • High area uniformity: Advanced multi-point RF feeding technology, special gas path distribution, and heating technology, etc., make the film uniformity index reach 8%
  • High consistency: using the advanced design concept of the semiconductor industry, the deviation between the substrates of one deposition is less than 2%
  • High process stability: Highly stable equipment ensures a continuous and stable process

Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace

Standard Spares:

  • Plugging tube 4 pcs
  • Furnace tube 1 pc
  • Vacuum pump 1 pc
  • Vacuum sealing flange 2 sets
  • Vacuum gauge 1 pc
  • Gas delivery & vacuum pump
  • RF plasma equipment


Optional Spares:

  • Quick release flange, Three-way flange
  • 7 inch HD touch scree




Plasma Enhanced Chemical Vapor Deposition Furnace Standard specification:

1. Heating System
Max.temperature1200℃ (1 hour)
Working temperature≤1100℃
Chamber sizeΦ100*1650mm (Tube diamater is customizable)
Chamber materialHigh purity alumina fiber board
ThermocoupleK type
Temperatureaccuracy±1℃
Temperature control

● 50 programmable segments for precise control of heating rate, cooling rate and dwell time.

● Built in PID Auto-Tune function with overheating & broken thermocouple broken protection.

● PLC automatic control system by PC controller inside.

● The temperature control system, sliding system (Time and Distance) could be controlled by program.

Heating length440mm
Constant heating length200mm
Heating elementResistance wire
Power supplySingle phase, 220V, 50Hz
Rated power9kW
2. RF Plasma Source
RF frequency13.56 MHz±0.005%
Output power500W
Max reflect power500W
RF output interface50 Ω, N-type, female
Power stability±0.1%
Harmonic component≤-50dbc
Supply voltage/FrequencySingle phase AC220V 50/60HZ
Whole efficiency>=70%
Power factor>=90%
Cooling methodForced air
3. Three precision mass flowmeters control system
External dimension600x600x650mm
Connector typeSwagelok SS joint
Standard range (N2)0~100sccm, 0~200sccm, or customizable
Accuracy±1.5%
Linear±0.5～1.5%
Repeatability±0.2%
Response time

Gas property: 1～4 Sec;
Electrical property: 10 Sec

Pressure range0.1～0.5 MPa
Max.pressure3MPa
InterfaceΦ6,1/4''
Display4 digit display
Ambient temperature5~45 high purity gas
Pressure gauge－0.1～0.15 MPa, 0.01 MPa/unit
Stop valveΦ6
Polish SS tubeΦ6
Low vacuum system included


Why Brother's Lab Plasma Enhanced Chemical Vapor Deposition Furnace?

  • Manufacturer with 10+ years' experience
  • Best quality
  • Customized design
  • Experienced workers
  • Big factory


Customers from more than 30 countries choose us

  • Satisfied customers offer proof of our commitment to excellent design, quality and cost efficiency.


Best service, Fast response

  • Free design for special furnace
  • Free technical support for the lifetime
  • Free sample test


If you're interested in our Plasma Enhanced Chemical Vapor Deposition Furnace, contact us now to get a quote!
























Product tags

refractories for blast furnace

,

continuous carbonization furnace

,

carbonization furnace
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Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace

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Product Detail
Brand Name :
Brother Furnace
Model Number :
BR-PECVD
Certification :
CE
Place of Origin :
China
MOQ :
1 Set
Price :
Negotiation
Contact Supplier
Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace

Zhengzhou Brother Furnace Co.,Ltd

Verified Supplier
6 Years
henan, zhengzhou
Since 1998
Business Type :
Manufacturer, Exporter
Main Products :
Lab Muffle Furnace, Industrial Muffle Furnace, High Temperature Vacuum Furnace
Total Annual :
300M-600M
Employee Number :
100~200 People
Certification Level :
Verified Supplier
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