Ta-W alloy round target
Preparation process: hot isostatic pressing, normal temperature sintering, powder gold treatment, etc
Target material form: plane target, multi-arc target, step target, special-shaped target
Applicable equipment: magnetron sputtering equipment, ion sputtering instrument, etc
package
shipping | According to the consumer’s demands. |
size | customized |
pay attention | heavy quantity is with preferential price. |
lead time | according to the quantity and materials. |