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8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
Specifications
Brand Name :
Forged
Model Number :
customized
Certification :
ISO9001:2008
Place of Origin :
Luoyang Henan, China
MOQ :
1 kg
Price :
can be negotiate
Payment Terms :
T/T, Western Union, MoneyGram,, L/C, D/P, D/A
Supply Ability :
50MT/month
Delivery Time :
1-30 days
Packaging Details :
Standard wooden case with foam sheet inside
brand :
forged
material :
niobium
density :
8.6g/cm3
purity :
over 99.95%
Description

niobium target purity 99.95% merchandise on hand customization

Niobium Target Introduction
With the characteristics of corrosion resistance, high temperature resistance and malleability, niobium target is widely used in coating industry, electronics industry, steel industry, chemical industry, optics, gemstone manufacturing, superconducting technology, aerospace. technology and other fields. Niobium target and sheet is the most common form of Nb product.
Niobium Target Production Technology

Refined by electron-beam, niobium targets are produced from niobium ingots. The target fabrication includes: mechanical deformation, machining (trimming and plane milling), vacuum re-crystallization annealing and finishing chemical treatment.

Higher density of target material is usually required in order to reduce the stomata in the material and improve the performance of the sputter film. The density affects not only the sputtering rate, but also the electrical and optical properties of the film. The higher the density of target material is, the better the film performance works.

In addition, enhancing density and strength of the target material can withstand the thermal stress better during the sputtering process. Density is also one of the key performance indicators of the target material.

Commodity Name 99.95% High Purity Niobium Disc
Size customizable
Surface Polish and bright
Purity 99.95%
Density 8.6g/cm3
Application Steel, superconducting material, aerospace, atomic energy, etc
Advantage

1) good superconductivity material

2) Higher melting point

3) Better Corrosion Resitance

4) Better wear-resisting
Technology Powder Metallurgy
Lead time according to the quantity and material
Product tags

niobium sputtering target

,

metal oxide varistor datasheet

,

metal oxide varistor specifications
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8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor

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Product Detail
Brand Name :
Forged
Model Number :
customized
Certification :
ISO9001:2008
Place of Origin :
Luoyang Henan, China
MOQ :
1 kg
Price :
can be negotiate
Contact Supplier
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor

Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.

Site Member
6 Years
henan, luoyang
Since 2001
Business Type :
Manufacturer
Main Products :
Tungsten Metal Alloy, Titanium Metal Alloy, Molybdenum Alloys
Total Annual :
1000000-100000000
Employee Number :
100~500
Certification Level :
Site Member
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