1,Description:
Material: Tungsten target materials are typically made from high-purity tungsten or tungsten alloys, specifically designed for use in physical vapor deposition (PVD) processes.
High Melting Point: Tungsten has an exceptionally high melting point of approximately 3,422 degrees Celsius (6,191 degrees Fahrenheit), allowing it to withstand the high temperatures generated during PVD processes.
Density: Tungsten target materials have a high density, typically ranging from 17.8 to 19.3 grams per cubic centimeter (g/cm³), ensuring a high deposition rate and efficient material utilization.
2,Specifications:
Material | High-purity tungsten or tungsten alloys |
Melting Point | Approximately 3,422 degrees Celsius (6,191 degrees Fahrenheit) |
Density | 17.8 - 19.3 grams per cubic centimeter (g/cm³) |
Thermal Conductivity | Excellent thermal conductivity |
Sputtering Rate | Relatively low sputtering rate, minimal material loss |
Purity | High levels of purity, minimal impurities |
Uniformity | Precise dimensions and uniformity for consistent film deposition |