Tungsten Rotatable Sputtering Target
Tungsten targets are mainly used in aerospace, rare earth smelting, electrical light sources, chemical equipment, medical equipment, metallurgical machinery, smelting equipment and petroleum etc..
PARAMETER
OD(mm) |
ID(mm) |
Length(mm) |
Custom Made |
140-300 |
120-280 |
100-3300 |
Model Number |
W1 |
|||
Shape |
customized |
|||
Chemical Composition |
99.95% W |
Feature
1. High density
2. High wear-resistant
3. High thermal conductivity with low thermal expansion coefficient
4. High vibration-damping capacity and high Young’s modulus
5. High oxidation resistance and corrosion resistance
Specification
Atomic number |
74 |
CAS number |
7440-33-7 |
Atomic mass |
183.84 [g/mol] |
Melting point |
3420 °C |
Boiling point |
5555 °C |
Density at 20 °C |
19.25 [g/cm3] |
Crystal structure |
Body-centered cubic |
Coefficient of linear thermal expansion at 20 °C |
4.410-6[m/(mK)] |
Thermal conductivity at 20 °C |
164 [W/(mK)] |
Specific heat at 20 °C |
0.13 [J/(gK)] |
Electrical conductivity at 20 °C |
18.2106[S/m] |
Specific electrical resistance at 20 °C |
0.055 [(mm2)/m] |
APPLICATIONS
semiconductor
chemical vapor deposition (CVD)
physical vapor deposition (PVD) display