W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting
Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum, etc
PARAMETER
OD(mm) |
ID(mm) |
Length(mm) |
Custom Made |
140-300 |
120-280 |
100-3300 |
Model Number |
W1 |
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Shape |
customized |
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Chemical Composition |
99.95% W |
Feature
Specification
Atomic number |
74 |
CAS number |
7440-33-7 |
Atomic mass |
183.84 [g/mol] |
Melting point |
3420 °C |
Boiling point |
5555 °C |
Density at 20 °C |
19.25 [g/cm3] |
Crystal structure |
Body-centered cubic |
Coefficient of linear thermal expansion at 20 °C |
4.410-6[m/(mK)] |
Thermal conductivity at 20 °C |
164 [W/(mK)] |
Specific heat at 20 °C |
0.13 [J/(gK)] |
Electrical conductivity at 20 °C |
18.2106[S/m] |
Specific electrical resistance at 20 °C |
0.055 [(mm2)/m] |
APPLICATIONS
semiconductor
chemical vapor deposition (CVD)
physical vapor deposition (PVD) display