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Laboratory DC and RF Sputtering Coating Machine, DC/MF Sputtering Lab.Coating Unit, R&D Lab. Sputtering System
Laboratory DC and RF Sputtering Coating Machine, DC/MF Sputtering Lab.Coating Unit, R&D Lab. Sputtering System
Laboratory DC and RF Sputtering Coating Machine, DC/MF Sputtering Lab.Coating Unit, R&D Lab. Sputtering System
Laboratory DC and RF Sputtering Coating Machine, DC/MF Sputtering Lab.Coating Unit, R&D Lab. Sputtering System
Specifications
Brand Name :
ROYAL
Model Number :
RTSP-400
Certification :
CE certification
Place of Origin :
MADE IN CHINA
MOQ :
1 set
Price :
negotiable
Payment Terms :
L/C, T/T
Supply Ability :
10 sets per month
Delivery Time :
8 weeks
Packaging Details :
Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Chamber :
Horizontal Orientation
Sputtering Sources :
MF, DC and RF
Sputtering Cathode :
Circular Planar type
Sputtering Target :
Al2O3, TiO, ITO, Cr, Zr, Au gold
Factory Location :
Shanghai city, China
Worldwide Service :
Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Training Service :
Machine operation, maintenance, coating process Recipes, program
Warranty :
Limited warranty 1 year for free, whole life for machine
OEM & ODM :
available, we support tailor made design and fabrication
Description

Laboratory Magnetron Sputtering Vacuum Coating System

1. The UHV sputtering system is equipped with

  • DC sputtering guns to deposit the semi-conductive and non-conductive materials ( Si, SiO2, Al2O3, Si3N4 ,Cr2O3,ITO and other materials).
  • RF sputtering gun to deposit the conductive material Aluminum, Silver, Gold etc.
  • DC and RF power supply sources can be exchanged flexible.

2. The UHV sputtering system applications of

  • Conductive coatings on polymeric materials, wood, fabrics at low temperatures less than 100 ℃

Application of conductive coatings on glass, ceramics and other dielectric materials.

Laboratory DC and RF Sputtering Coating Machine, DC/MF Sputtering Lab.Coating Unit, R&D Lab. Sputtering System

3. Technical Performance:

3. 1 Ultimate Vacuum Pressure: better than 5.0×10-6 Torr.

3. 2. Operating Vacuum Pressure: 1.0×10-4 Torr.

3. 3. Pumpingdown Time: from 1 atm to 1.0×10-4 Torr≤ 3 minutes ( room temperature, dry, clean and empty chamber)

3. 4. Metalizing material (sputtering ) Al, Cr, Sn, Ti, SS, Cu… etc.

3. 5. Operating Model: Full Automatically /Semi-Auto/ Manually

4.​ Structure

The UHV Sputtering vacuum coating machine contains key completed system listed below:

1. Vacuum Chamber

2. Rouhging Vacuum Pumping System (Backing Pump Package)

3. High Vacuum Pumping System (Diffusion Pump)

4. Electrical Control and Operation System

5. Auxiliarry Facility System (Sub System)

6. Deposition System

For more specifications, please contact us. Customized inquiries are welcomed.

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Laboratory DC and RF Sputtering Coating Machine, DC/MF Sputtering Lab.Coating Unit, R&D Lab. Sputtering System

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Product Detail
Brand Name :
ROYAL
Model Number :
RTSP-400
Certification :
CE certification
Place of Origin :
MADE IN CHINA
MOQ :
1 set
Price :
negotiable
Contact Supplier
Laboratory DC and RF Sputtering Coating Machine, DC/MF Sputtering Lab.Coating Unit, R&D Lab. Sputtering System
Laboratory DC and RF Sputtering Coating Machine, DC/MF Sputtering Lab.Coating Unit, R&D Lab. Sputtering System

SHANGHAI ROYAL TECHNOLOGY INC.

Verified Supplier
8 Years
Since 2006
Business Type :
Manufacturer
Main Products :
PVD Vacuum Coating Machine, Magnetron Sputtering Coating Machine, Cathodic Arc Deposition Equipment
Employee Number :
10~49
Certification Level :
Verified Supplier
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