Specifications
Brand Name :
ZMSH
Model Number :
Silicon Carbide
Place of Origin :
China
Delivery Time :
2-4 weeks
Payment Terms :
100%T/T
Material :
Silicon Carbide
Diameter :
2inch 4inch 6inch 8inch
Particle :
Free/Low Particle
Resistivity :
High/Low Resistivity
Thickness :
350um
Surface Finish :
Single/Double Side Polished
Grade :
Production/ Research/ Dummy
Type :
4H/6H-P
Description

6inch SiC Wafer 4H/6H-P Silicon Carbide Substrate DSP (111) Semiconductor RF Microwave LED Lasers

Description of SiC Wafer:

The 6-inch P-Type Silicon Carbide (SiC) Wafer in either 4H or 6H polytype. It has similar properties as the N-type Silicon Carbide (SiC) wafer, such as high-temperature resistance, high thermal conductivity, high electrical conductivity, etc. P-type SiC substrate is generally used for manufacturing power devices, especially the manufacturing of Insulated Gate Bipolar Transistors (IGBT). The design of IGBT often involves P-N junctions, where P-type SiC can be advantageous for controlling the behavior of the devices.

The Character of SiC Wafer:

1. Radiation Resistance:
Silicon carbide is highly resistant to radiation damage, making 4H/6H-P SiC wafers ideal for use in space and nuclear applications where radiation exposure is significant.

2. Wide Bandgap:
4H-SiC: The bandgap is approximately 3.26 eV.
6H-SiC: The bandgap is slightly lower, at about 3.0 eV.
These wide bandgaps allow SiC wafers to operate at higher temperatures and voltages compared to silicon-based materials, making them ideal for power electronics and extreme environmental conditions.
3. High Breakdown Electric Field:
SiC wafers have a much higher breakdown electric field (around 10 times that of silicon). This allows for the design of smaller, more efficient power devices that can handle high voltages.
4. High Thermal Conductivity:
SiC has excellent thermal conductivity (around 3-4 times higher than silicon), allowing devices made from these wafers to operate at high power without overheating. This makes them ideal for high-power applications where heat dissipation is critical.
5. High Electron Mobility:
4H-SiC has a higher electron mobility (~950 cm²/Vs) compared to 6H-SiC (~400 cm²/Vs), which means 4H-SiC is more suitable for high-frequency applications.
This high electron mobility allows for faster switching speeds in electronic devices, making 4H-SiC preferable for RF and microwave applications.
6. Temperature Stability:
SiC wafers can operate at temperatures well above 300°C, much higher than silicon-based devices, which are typically limited to 150°C. This makes them highly desirable for use in harsh environments, such as automotive, aerospace, and industrial systems.
7. High Mechanical Strength:
SiC wafers are mechanically robust, with excellent hardness and resistance to mechanical stress. They are suitable for use in environments where physical durability is essential.

Form of SiC Wafer:

6-inch diameter Silicon Carbide (SiC) Substrate Specification
Grade Zero MPD Production
Grade (Z Grade)
Standard Production
Grade (P Grade)
Dummy Grade
(D Grade)
Diameter 145.5 mm~150.0 mm
Thickness 350 μm ± 25 μm
Wafer Orientation Off axis: 2.0°-4.0°toward [1120] ± 0.5° for 4H/6H-P, On axis:〈111〉± 0.5° for 3C-N
Micropipe Density 0 cm-2
Resistivity p-type 4H/6H-P ≤0.1 Ω.cm ≤0.3 Ω.cm
Primary Flat Orientation p-type 4H/6H-P {1010} ± 5.0°
Primary Flat Length 32.5 mm ± 2.0 mm
Secondary Flat Length 18.0 mm ± 2.0 mm
Secondary Flat Orientation Silicon face up: 90° CW. from Prime flat ± 5.0°
Edge Exclusion 3 mm 6 mm
LTV/TTV/Bow /Warp ≤2.5 μm/≤5 μm/≤15 μm/≤30 μm ≤10 μm/≤15 μm/≤25 μm/≤40 μm
Roughness Polish Ra≤1 nm
CMP Ra≤0.2 nm Ra≤0.5 nm
Edge Cracks By High Intensity Light None Cumulative length ≤ 10 mm, single length≤2 mm
Hex Plates By High Intensity Light Cumulative area ≤0.05% Cumulative area ≤0.1%
Polytype Areas By High Intensity Light None Cumulative area≤3%
Visual Carbon Inclusions Cumulative area ≤0.05% Cumulative area ≤3%
Silicon Surface Scratches By High Intensity Light None Cumulative length≤1×wafer diameter
Edge Chips High By Intensity Light None permitted ≥0.2mm width and depth 5 allowed, ≤1 mm each
Silicon Surface Contamination By High Intensity None
Packaging Multi-wafer Cassette or Single Wafer Container

Application of SiC Wafer:

Power Electronics:

Used in diodes, MOSFETs, and IGBTs for high-voltage, high-temperature applications like electric vehicles, power grids, and renewable energy systems.
RF and Microwave Devices:

Ideal for high-frequency devices such as RF amplifiers and radar systems.
LEDs and Lasers:

SiC is also used as a substrate material for the production of GaN-based LEDs and lasers.
Automotive Electronics:

Used in electric vehicle powertrain components and charging systems.
Aerospace and Military:

Due to their radiation hardness and thermal stability, SiC wafers are used in satellites, military radars, and other defense systems.
Industrial Applications:

Employed in industrial power supplies, motor drives, and other high-power, high-efficiency electronic systems.

Application Picture Of SiC Wafer:

6inch SiC Wafer 4H/6H-P Silicon Carbide Substrate DSP (111) Semiconductor RF Microwave LED Lasers

Customization:

Customization of Silicon Carbide (SiC) wafers is essential to meet the specific needs of various advanced electronic, industrial, and scientific applications. We can offer a range of customizable parameters to ensure the wafers are optimized for particular device requirements. Below are the key aspects of SiC wafer customization:Crystal Orientation; Diameter and Thickness; Doping Type and Concentration; Surface Polishing and Finish; Resistivity; Epitaxial Layer;Orientation Flats and Notches;SiC-on-Si and Other Substrate Combinations.

Packing and Shipping:

6inch SiC Wafer 4H/6H-P Silicon Carbide Substrate DSP (111) Semiconductor RF Microwave LED Lasers

FAQ:

1.Q: What is 4H and 6H SiC?
A: 4H-SiC and 6H-SiC represent hexagonal crystal structures, with "H" indicating hexagonal symmetry and the numbers 4 and 6 the layers in their unit cells. This structural variation affects the material's electronic band structure, which is a key determinant of a semiconductor device's performance.

2.Q: What is P type substrate?
A: p-type material is a semiconductor that has a positive charge carrier, which is known as a hole. The hole is created by introducing an impurity into the semiconductor material, which has one less valence electron than the semiconductor atoms.

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6inch SiC Wafer 4H/6H-P Silicon Carbide Substrate DSP (111) Semiconductor RF Microwave LED Lasers

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6inch SiC Wafer 4H/6H-P Silicon Carbide Substrate DSP (111) Semiconductor RF Microwave LED Lasers

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Brand Name :
ZMSH
Model Number :
Silicon Carbide
Place of Origin :
China
Delivery Time :
2-4 weeks
Payment Terms :
100%T/T
Material :
Silicon Carbide
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6inch SiC Wafer 4H/6H-P Silicon Carbide Substrate DSP (111) Semiconductor RF Microwave LED Lasers
6inch SiC Wafer 4H/6H-P Silicon Carbide Substrate DSP (111) Semiconductor RF Microwave LED Lasers
6inch SiC Wafer 4H/6H-P Silicon Carbide Substrate DSP (111) Semiconductor RF Microwave LED Lasers

SHANGHAI FAMOUS TRADE CO.,LTD

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shanghai, shanghai
Since 2013
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Total Annual :
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