Silicon Carbide Wafers 3C-N type 5*5 & 10*10mm inch diameter thickness 350 μm±25 μm
Silicon Carbide Wafers 3C-N type's abstract
This abstract introduces Silicon Carbide (SiC) 3C-N type wafers, available in 5x5mm and 10x10mm sizes with a thickness of 350 μm ± 25 μm. These wafers are designed to meet the precise needs of high-performance applications in optoelectronics, power electronics, and AR technologies. With their superior thermal conductivity, mechanical strength, and electrical properties, SiC 3C-N wafers offer enhanced durability and heat dissipation, making them ideal for devices requiring high thermal stability and efficient energy management. The specified dimensions and thickness ensure compatibility across a wide range of advanced industrial and research applications.
Silicon Carbide Wafers 3C-N type's showcase
Silicon Carbide Wafers 3C-N type's properties & data chart
Material Type: 3C-N Silicon Carbide (SiC)
This crystalline form offers excellent mechanical and thermal properties, suitable for high-performance applications.
Size:
Available in two standard sizes: 5x5mm and 10x10mm.
Thickness:
Thickness: 350 μm ± 25 μm
Precision-controlled thickness ensures mechanical stability and compatibility with various device requirements.
Thermal Conductivity:
SiC exhibits superior thermal conductivity, allowing for efficient heat dissipation, making it ideal for applications requiring thermal management, such as AR glasses and power electronics.
Mechanical Strength:
SiC has a high hardness and mechanical strength, providing durability and resistance to wear and deformation, essential for demanding environments.
Electrical Properties:
SiC wafers possess high electrical breakdown voltage and low thermal expansion, which are crucial for high-power and high-frequency devices.
Optical Clarity:
SiC has excellent transparency in certain optical wavelengths, making it suitable for use in optoelectronic and AR technologies.
High Stability:
SiC's resistance to thermal and chemical stress ensures long-term reliability in harsh conditions.
These properties make SiC 3C-N type wafers highly versatile for use in advanced electronic and optoelectronic devices, as well as next-generation AR technologies.
5*5 & 10*10mm 英寸 SiC 晶片产品标准
5*5 & 10*10mm inch diameter Silicon Carbide (SiC)
等级 Grade | 研究级 Research Grade (R Grade) | 试片级 Dummy Grade (D Grade) | ||||
Production Grade (P Grade) | ||||||
直径 Diameter | 5*5mm±0.2mm & 10*10mm±0.2mm | |||||
厚度 Thickness | 350μm±25 μm | |||||
晶片方向 Wafer Orientation | Off axis: 2.0°-4.0°toward [112 | 0] ± 0.5° for 4H/6H-P, On axis:〈111〉± 0.5° for 3C-N | ||||
微管密度 Micropipe Density | 0 cm-2 | |||||
电阻率 ※Resistivity | 4H/6H-P | ≤0.1 Ω.cm | ||||
3C-N | ≤0.8 mΩ•cm | |||||
主定位边方向 Primary Flat Orientation | 4H/6H-P | {10-10} ±5.0° | ||||
3C-N | {1-10} ±5.0° | |||||
主定位边长度 Primary Flat Length | 15.9 mm ±1.7 mm | |||||
次定位边长度 Secondary Flat Length | 8.0 mm ±1.7 mm | |||||
次定位边方向 Secondary Flat Orientation | Silicon face up: 90° CW. from Prime flat ±5.0° | |||||
边缘去除 Edge Exclusion | 3 mm | 3 mm | ||||
总厚度变化/弯曲度/翘曲度 TTV/Bow /Warp | ≤2.5 μm/≤5 μm/≤15 μm/≤30 μm | |||||
表面粗糙度※ Roughness | Polish Ra≤1 nm | |||||
CMP Ra≤0.2 nm | ||||||
边缘裂纹(强光灯观测) Edge Cracks By High Intensity Light | None | 1 allowed, ≤1 mm | ||||
六方空洞(强光灯观测) ※ Hex Plates By High Intensity Light | Cumulative area≤1 % | Cumulative area≤3 % | ||||
多型(强光灯观测) ※ Polytype Areas By High Intensity Light | None | Cumulative area≤2 % | Cumulative area≤5% | |||
Si 面划痕(强光灯观测)# Silicon Surface Scratches By High Intensity Light | None 3 allowed, ≤0.5 mm each 5 allowed, ≤1 mm each | 5 scratches to 1×wafer diameter cumulative length | 8 scratches to 1×wafer diameter cumulative length | |||
崩边(强光灯观测) Edge Chips High By Intensity Light light | None | 3 allowed, ≤0.5 mm each | 5 allowed, ≤1 mm each | |||
硅面污染物(强光灯观测) Silicon Surface Contamination By High Intensity | None | |||||
包装 Packaging | Multi-wafer Cassette or Single Wafer Container |
Notes:
※Defects limits apply to entire wafer surface except for the edge exclusion area. # The scratches should be checked on Si face only.
Silicon Carbide Wafers 3C-N type's applications
Silicon Carbide (SiC) wafers, specifically 3C-N type, are a variant of SiC that possesses unique characteristics due to its cubic crystal structure (3C-SiC). These wafers are primarily used in various high-performance and specialized applications due to their excellent properties, such as high thermal conductivity, wide bandgap, and strong mechanical strength. Some key applications of 3C-N type SiC wafers include:
In summary, 3C-N type SiC wafers are primarily used in power electronics, high-frequency devices, sensors for harsh environments, optoelectronics, quantum devices, and aerospace applications, where their unique properties such as wide bandgap, thermal stability, and high electron mobility provide significant advantages over traditional silicon-based materials.
Q&A
What is 3C silicon carbide?
3C Silicon Carbide (3C-SiC) is one of the polytypes of silicon carbide, characterized by its cubic crystal structure, distinguishing it from the more common hexagonal forms like 4H-SiC and 6H-SiC. The cubic lattice of 3C-SiC provides several notable benefits.
Firstly, 3C-SiC exhibits higher electron mobility, making it advantageous for high-frequency and power electronic devices, especially in applications requiring fast switching. Although its bandgap is lower (around 2.36 eV) compared to other SiC polytypes, it still performs well in high-voltage and high-power environments.
Additionally, 3C-SiC retains the high thermal conductivity and mechanical strength typical of silicon carbide, enabling it to operate in extreme conditions, such as high-temperature and high-stress environments. It also possesses good optical transparency, making it suitable for optoelectronic applications like LEDs and photodetectors.
As a result, 3C-SiC is widely used in power electronics, high-frequency devices, optoelectronics, and sensors, particularly in high-temperature and high-frequency scenarios, where its unique properties offer significant advantages.