InP wafer 2inch 3inch 4inch VGF P type N type Depant Zn S Fe Undoped Prime Grade Testing Grade
Indium phosphide wafers(InP wafers) are prepared from indium phosphide which is a binary semiconductor. InP wafer offers a superior electron velocity than most of the other popular semiconductors such as silicon. This superior electron velocity makes it the most useful compound for optoelectronic applications, rapid transistors, and resonance tunneling diodes. The most common use of InP wafers is in high-frequency and high-power electronic devices. InP wafer is also widely used in high-speed fiber optic communication because indium phosphide emits and detects wavelengths above 1000nm. InP wafer is also used as a substrate for laser and photodiodes in Datacom and Telecom applications. With the advent of 5G on the horizon, the InP wafer market will touch the summit. As a result, InP wafers will be the most desired wafers to use in optical fiber connections, metro-ring access networks, company networks, data centers, etc. We are offering a 99.99% pure InP wafer that will be most efficient and effective.
The Character of InP Wafer:
1. Bandgap: InP has a narrow bandgap of around 1.35 eV at room temperature, making it suitable for applications in optoelectronics such as photodetectors, lasers, and solar cells.
2. High Electron Mobility: InP has high electron mobility compared to other semiconductor materials, which is beneficial for high-speed electronic devices like high-frequency transistors and integrated circuits.
3. High Thermal Conductivity: InP has relatively high thermal conductivity, allowing for efficient heat dissipation in high-power electronic devices.
4. Optical Properties: InP wafers have excellent optical properties, including high transparency in the infrared region, making them ideal for optical communication and sensing applications.
5. Low Noise Properties: InP exhibits low noise characteristics, making it suitable for low-noise amplifiers and receivers in communication systems.
6. Chemical Stability: InP is chemically stable, which contributes to its reliability in various environments.
7. Lattice Matched to InGaAs: InP is lattice-matched with Indium Gallium Arsenide (InGaAs), enabling the growth of high-quality heterostructures for optoelectronic devices.
8. High Breakdown Voltage: InP wafers have a high breakdown voltage, making them suitable for high-power and high-frequency applications.
9. High Electron Saturation Velocity: InP exhibits a high electron saturation velocity, which is beneficial for high-speed electronic devices.
10. Doping: InP wafers can be doped to create both n-type and p-type regions, allowing for the fabrication of various types of electronic and optoelectronic devices.
The Form of InP Wafer:
Material | InP |
---|---|
Growth Method | LEC,VCZ/P-LEC , VGF, VB |
Lattice (A) | a=5.869 |
Structure | M3 |
Melting Point | 1600℃ |
Density(g/cm3) | 4.79 g/cm3 |
Doped Material | Undoped S-doped Zn-doped Fe-doped |
Type | N N P N |
Carrier Concentration (cm-3) | (0.4-2) x 1016 (0.8-3) x 1018 (4-6) x 1018 (0.6-2) x 1018 |
Mobility (cm2v-1s-1) | (3.5-4) x 103 (2.2-2.4) x 103 (1.3-1.6) x 103 |
EPD (Average) | 3 x 104. cm2 2 x 103/cm2. 2 x 104/cm2. 3 x 104/cm2 |
The Physical Photo of InP Wafer:
Application of InP Wafer:
1. Photonics:
Lasers and Detectors: With its narrow bandgap (~1.35 electron volts), InP is suitable for devices like lasers and detectors in photonics applications.
Optical Communication: InP wafers play a crucial role in optical communication systems, used in components like lasers and modulators for fiber optics.
2. Semiconductor Devices:
High-Speed Transistors: The high electron mobility of InP makes it an ideal material for manufacturing high-speed transistors.
Solar Cells: InP wafers exhibit good performance in solar cells, enabling efficient photovoltaic conversion.
3. Microwave and RF Devices:
Microwave Integrated Circuits (MICs): InP wafers are used in the fabrication of microwave and RF integrated circuits, providing high-frequency response and performance.
Low-Noise Amplifiers: InP wafers find important applications in low-noise amplifiers in communication systems.
4. Photovoltaic Devices:
Photovoltaic Cells: InP wafers are utilized in the manufacturing of high-efficiency photovoltaic cells for solar power systems.
5. Sensor Technology:
Optical Sensors: InP wafers hold potential in optical sensor applications, used in various sensor technologies and imaging systems.
6. Integrated Circuits:
Optoelectronic Integrated Circuits: InP wafers are employed in the fabrication of optoelectronic integrated circuits for applications in optical communication and sensing.
7. Optical Devices:
Fiber Optic Amplifiers: InP wafers play a critical role in fiber optic amplifiers for signal amplification and transmission in fiber optic communications.
The Application Pictures of InP Wafer:
Here are some aspects of InP wafer customization:
1. Wafer Size: InP wafers can be customized in terms of diameter (2-inch, 3-inch, 4-inch) and thickness to suit the specific needs of the application.
2. Orientation: The orientation of the wafer ((100), (111)A, (111)B) can be specified based on the desired crystal orientation for the intended application.
3. Doping Profile: Custom doping profiles can be created by controlling the concentration and distribution of dopants (silicon, sulfur) to achieve specific electrical properties required for device fabrication.
4. Surface Quality: The surface quality of the wafer can be customized to meet the required roughness specifications, ensuring optimal performance in applications such as optoelectronics and photonics.
5. Epitaxial Layers: InP wafers can be customized with epitaxial layers of other materials like InGaAs, InAlGaAs, or InGaAsP to create heterostructures for specialized devices like lasers, photodetectors, and high-speed transistors.
6.Specialized Coatings: InP wafers can be coated with specific materials or films to enhance their performance in particular applications, such as anti-reflection coatings for optical devices.
1.Q: What is an InP semiconductor?
A: Indium phosphide (InP) refers to a binary semiconductor that consists of indium (In) and phosphorus (P). Like gallium arsenide (GaAs) semiconductors that come with a zincblende crystal structure, InP is classified under a group of materials that belong to the III-V semiconductors.
2.Q: What is the use of indium phosphide?
A:Indium phosphide substrates are principally used for the growth of ternary (InGaAs) and quaternary (InGaAsP) alloy-containing structures, used for the fabrication of long-wavelength (1.3 and 1.55 μm) diode lasers, LEDs, and photodetectors.
3.Q: What are the advantages of InP?
A: High Electron Mobility: InP exhibits electron mobility nearly ten times greater than silicon, making it perfect for high-speed transistors and amplifiers in telecommunications and radar systems.