Thickness 430um 0.1mm 0.2mm 2inch sapphire double side polished wafer
Description
Sapphire optical windows are ideal for applications where high pressure, vacuum, or corrosive atmospheres are a consideration. Sapphire, a single crystal form of Al2O3, is resistant to attack by strong acids due to its high dielectric constant. It has high compressive strength and a high melting point. It is also resistant to UV radiation darkening.
Specification
Crystal Orientation | C-plane (0001) miscut to M |
Mis-Orientation Towards Laser Mark | 0.3° off axis ± 0.1° Towards M plane (90° away from major flat assumed to be cut along an a-plane) Away from the r (102) direction |
Mis Orientation Towards Primary Flat | 0° ± 0.1° |
Wafer Diameter | 50.8± 0.05mm |
Thickness | 430± 20mm |
Major Flat | 16.0mm ± 1.0mm |
Major Flat Location | A-axis ± 0.3° |
Front Surface | Epi Polish< 0.3nm |
Backside Roughness | <1micron |
TTV | £ 10mm |
Warp | £ 10mm |
Bow | £ 10mm |
Edge Condition | Edge defect not to exceed SEMI M3-91,Table 2 |
Substrate Laser Marking | Standard Backside, parallel to flat |
Packaging | Class 100 clean room environment, in cassettes of 25, under a nitrogen atmosphere |
The 2 inch DSP double side polished sapphire substrates can be manufactured from high quality optical grade Kyropoulos grown sapphire crystals.
high purity single crystal sapphire epitaxial substrate is suitable for direct epitaxial process, PSS process, ALN process and other epitaxial methods. It has the characteristics of uniform wavelength, high brightness and small STD. we can accept product customization for the technical specifications, and produce sapphire single / double polishing substrates with different external dimensions based on C (0001), a (11-20) and m (1100) crystal orientations, with notch or straight edge crystal orientations.
Process Flow