Pass-through rotary spray cleaner TW-CL360

Product Description:

The online basket spray cleaning machine is a specialized device designed for cleaning semiconductor products. It utilizes a unique rotating spray and multi-slot vibration rinsing function to ensure thorough cleaning. The equipment is equipped with precision filtering devices in each cleaning section, and FFU filters are installed on the top of the machine to maintain overall cleanliness during operation.

Performance:

• Cleaning Pressure: 0.3~0.6Mpa
• Cleaning Method: Rotating Spray
• Rinsing Method: Soaking and Rinsing
• Rinsing Oscillation Frequency: 1-10 Times/minute
• Rotation Frequency: 1-10 Rpm
• Internal Air Filtration: FFU
• Water Quality Monitoring: Conductivity Meter
• Workpiece Movement Method: Robot Arm Grabbing and Moving
• Water Temperature Control: Normal Temperature~40℃ ± 2℃
• Direction Of Movement: From Right To Left (front View)
• Heating Device: 4KW/piece
• Power Supply: 380V 50HZ
• Cooling Device: Cooling Water Circulation
• Power: 18KW (estimated Rated)
• Filtering Device: 0.45μm Filterate
• Overall Dimensions: L3500W1600H2000(mm)

Application:

The online basket spray cleaning machine is specifically designed for cleaning semiconductor products. It is suitable for removing contaminants, residues, and particles from semiconductor components, ensuring their cleanliness and functionality. It can be used in semiconductor manufacturing facilities, electronics assembly plants, and other related industries.

FAQ (Frequently Asked Questions):

1. How does the online basket spray cleaning machine work?
   The machine utilizes a rotating spray and multi-slot vibration rinsing function to clean semiconductor products. The workpieces are transported by a mechanical arm to each section for cleaning, rinsing, and drying before being sent out. Precision filtering devices and FFU filters ensure cleanliness during the process.

2. What cleaning medium is used in the machine?
   The machine can use DI water (Deionized water) or cleaning agents depending on the specific requirements of the cleaning process.

3. How long does the cleaning and rinsing process take?
   The duration of the spray cleaning and vibration rinsing processes can vary depending on the specific requirements and the condition of the semiconductor products. Typically, it can range from 1 to 20 minutes.

4. Is the machine easy to operate?
   Yes, the equipment operation is simple. By pressing the start button, all processes are automatically completed by the machine according to the predetermined program.

5. What are the power requirements for the machine?
   The machine requires a power supply of 380V 50HZ. The estimated rated power is 18KW.

6. Can the machine be customized to meet specific needs?
   Yes, the machine can be customized according to specific requirements such as dimensions, cleaning parameters, and other specifications. It is advisable to communicate your detailed requirements with the manufacturer for customization options.

Process Flow Diagram

Feed Spray cleaning Oscillating rinsing Oscillating rinsing Discharge