Titanium Target Sputtering Coating Titanium High Purity Titanium Target Purity 99.99% Titanium Target

Sputtering target (purity: 99.9%-99.999%)Square Pure Titanium Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target

PVD coating Grade 1 Titanium Arc Target Ti Target titanium sputtering target

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Clean the surface to avoid defects such as oil stains, scratches, etc.

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Sputtering targets include metals, alloys, and ceramic compounds.
Sputtering is one of the main techniques for preparing thin-film materials. It uses ions generated by an ion source to accelerate and accumulate in a vacuum to form a high-speed energy ion beam, which bombards the solid surface, and exchanges kinetic energy between the ions and the atoms on the solid surface. The atoms on the solid surface leave the solid and are deposited on the surface of the substrate. The bombarded solid is the raw material for preparing the sputtering deposition film, which is called the sputtering target. Various types of sputtered thin film materials have been widely used in semiconductor integrated circuits, solar photovoltaics, recording media, flat displays, and surface coatings of workpieces.
High-purity and high-density sputtering targets include:
Sputtering target (purity: 99.9%-99.999%)
Magnetron sputtering coating is a new physical vapor deposition method, which uses an electron gun system to emit and focus electrons on the plated material, so that the sputtered atoms follow the momentum conversion principle and fly away from the material to the substrate with high kinetic energy to form a film. This plated material is called sputtering target.

Q: Why choose us?
A1: We have 14 years experience for titanium products making.
A2: sample order is acceptable.
A3: lower price, good quality and short delivery time.
A4:The quotation can be make within 24 hours.
A5: ISO9001:2015 certification
A6: Give us drawing, make your drawings and ideas become a reality!
A7: Provide third-party quality inspection reports.