Product Description:

The Metal Sputtering Target is bonded with indium, which ensures that the target is both durable and reliable. The use of indium bonding also ensures that the target can be used in a variety of different environments.

The Metal Sputtering Target is formed using a Hot Isostatic Pressing (HIP) process. This process ensures that the target is of the highest quality and can withstand even the most demanding of applications. The HIP process also ensures that the target is resistant to deformation and cracking.

The Metal Sputtering Target features a surface roughness of Ra < 0.8 Um. This ensures that the target is smooth and consistent, which is essential for effective sputtering. The precise surface roughness also ensures that the target is compatible with a wide range of different sputtering methods.

The Metal Sputtering Target is available in both single and multiple configurations. This allows for flexibility in terms of application and ensures that the target can be used in a variety of different settings.

Overall, the Metal Sputtering Target is a high-quality product that is perfect for use in a variety of different applications. Whether you are using a hand-held metal detector, an electrostatic powder coating gun, or working with H beam steel, this product is designed to meet your needs. So why wait? Order your Metal Sputtering Target today and experience the difference for yourself!

Features:

• Product Name: Metal Sputtering Target
• Shape: Round
• Technique: Forged And CNC Machined
• Surface Finish: Polished
• Target Bonding: Indium
• Substrate Compatibility: Customized
• Material: Alloy Steel Metal
• Manufactured using H Beam Steel
• Can be detected by Conveyor Metal Detector Machine

Technical Parameters:

Applications:

The Metal Sputtering Targets are used in various applications, including the manufacturing of semiconductors, solar cells, and flat panel displays. The targets are also used in the production of architectural glass, automotive glass, and special coatings.

The Metal Sputtering Targets are used in the production of H Beam Steel, which is used in the construction industry. The targets are also used in the production of conveyor metal detector machines, which are used in the food industry to detect metal contaminants in food products. Industrial metal detector conveyors are also used in the pharmaceutical industry to detect metal contamination in drugs.

The Metal Sputtering Targets are also used in the production of thin films for magnetic storage devices, optical storage devices, and microelectromechanical systems (MEMS).

In conclusion, Metal Sputtering Targets are essential materials used in various industries for thin-film deposition. They are used in various applications, including the production of H Beam Steel, conveyor metal detector machines, and industrial metal detector conveyors. They are also used in the production of thin films for magnetic storage devices, optical storage devices, and MEMS.

Customization:

Customize your Round Metal Sputtering Target with our Product Customization Services. Choose from a polished or anodized surface, and customize the crystal structure to fit your specific needs. Our Metal Sputtering Target is made from high-purity Alloy Steel Metal with a purity of 99.99%. The surface roughness is Ra < 0.8 Um. Perfect for use with a Hand Held Metal Detector.

Support and Services:

The Metal Sputtering Target product technical support and services include:

• Expert consultation on target selection, material compatibility, and process optimization
• Custom target manufacturing to meet specific customer requirements
• Target bonding and backing plate services
• Target refurbishment and reconditioning
• On-site target installation and training
• Remote technical support and troubleshooting