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IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
Specifications
Brand Name :
JUNHE
Model Number :
1020
Certification :
ISO9001 TS16949 SGS
Place of Origin :
Changzhou in china
MOQ :
500 Kilograms
Price :
Negotiable
Supply Ability :
2 Tons per Day
Delivery Time :
Ten days after receipt of advance payment
Packaging Details :
1000kg/barrel
Name :
Silicon Wafer Cleaning
Application :
IT Industry
PH :
12.0-14.0
Free alkalinity(piont) :
≧13.5mg
name :
si wafer cleaning
model :
1020
Description

IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

The RCA clean process is based on a cleaning method developed at RCA Corporation to remove organic residue from silicon wafers. The cleaning solution is made up of 5 parts water, 1 part 27% ammonium hydroxide and 1 part 30% hydrogen peroxide. It removes organic contaminants and leaves a thin layer of oxidized silicon on the surface of the wafer.

Silicon Wafer Cleaning feature

1) single group products with perfect PPR(performance price ratio)

2) be free from calcium, magnesium, metal, copper, lead and phosphor, and meet the requirement of ROHS.

3)good degreasing performance to meet the requirement of high-accuracy IT area.

Silicon Wafer Cleaning technical parameter

classification

project

 JH-1020 Silicon Wafer Cleaning Test Standard
Appearance Colorless to yellowish liquid visualization
Specific weight 1.01-1.25 densimeter
pH 12.0-14.0 PH instrument
free alkalinity(piont) ≧13.5mg CYFC

Silicon Wafer Cleaning instructions

1) put pure water into cleaning tank till three-quarter, then, add agent in 3% -5% concentration, add water till working level, last, heat the bath solution till working temperature.

2) need to change bath solution completely after degreasing certain amount silicon slice.

3) reduce exposed time in air to avoid oxidation.

4) working temperature 50-65 degree, disposal time: 2-5minutes.

IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

Product tags

cleaning of silicon wafer

,

silicon wafer cleaning

,

wafer cleaning process
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IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

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Product Detail
Brand Name :
JUNHE
Model Number :
1020
Certification :
ISO9001 TS16949 SGS
Place of Origin :
Changzhou in china
MOQ :
500 Kilograms
Price :
Negotiable
Contact Supplier
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

Changzhou Junhe Technology Stock Co.,Ltd

Verified Supplier
9 Years
changzhou
Since 1998
Business Type :
Manufacturer
Main Products :
Zinc Flake Coating, Dacromet Coating, Dip Spin Coating Machine
Total Annual :
1300-1500
Employee Number :
200~250
Certification Level :
Verified Supplier
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