Titanium Silicon Sputtering Target (TiSi) alloy 85:15/ 80:20 / 75:25 at%

TiSi sputtering target has a wide range of application prospects in machining, electronics, optics and other fields. TiSi target is produced by hot isostatic pressing, smelting and other technologies

Silicon alloy is the coating material of nitride hard coating. Silicon ensures excellent oxidation resistance, and titanium ensures high hardness of the coating. The combination of the two has wear resistance even at extremely high temperature. Titanium silicon nitrogen coating has a strong wear resistance, and there is no problem to use coolant in high-speed machining.

During the binding process of titanium silicon sputtering target, attention should be paid to the surface metallization. The surface of titanium silicon material is relatively dense, and it needs to be sandblasted and other surface treatment. When binding, it is necessary to adopt sectional heating and furnace cooling to prevent cracking.

Application field of sputtering coating: Sputtering coating is widely used in packaging coating, decoration coating, architectural glass coating, automobile glass coating, low radiation glass coating, flat panel display, optical communication / optical industry, optical data storage industry, optical data storage industry, magnetic data storage industry, optical coating, semiconductor field, automation, solar energy, medical treatment, self lubrication film, capacitor Device coating, other functional coating, etc. (click to enter the detailed introduction)

Sputtering target backplane supply, bonding service: the center provides a variety of sputtering target backplane, including oxygen-free copper, molybdenum, aluminum, stainless steel and other materials. At the same time, it provides the welding service between the target and the back plate.

The main products are :

High purity aluminum Al, high purity copper Cu, high purity titanium Ti, high purity silicon Si, high purity gold Au, high purity silver AG, high purity indium in, high purity magnesium mg, high purity zinc Zn, high purity platinum Pt, high purity germanium Ge, high purity nickel Ni, High purity tantalum TA, gold germanium alloy Auge, gold nickel alloy auni, nickel chromium alloy NiCr, titanium aluminum alloy TiAl, copper indium gallium alloy cuinga, copper indium gallium selenium alloy CuInGaSe, zinc aluminum alloy ZnAl, aluminum silicon alloy AlSi and other metal coating materials.