Chromium Plate Sputtering Target

Chromium plate sputtering target material is silvery white shiny metal, pure chromium has ductility, and chromium containing impurities is hard and brittle. The density is 7.19g/cm3. Soluble in strong alkali solution. Chromium has a high corrosion resistance, and oxidation is slow in the air, even in the state of red heat. Insoluble in water. Protection by plating on metal

• Description

The effect of different processing methods on the sintering density of chromium target. In the process of mechanical pressing, two-way pressing is adopted without any molding agent and deoxidizer. The target density of Cr ring is 78% - 80% by mechanical pressing + vacuum sintering; the target density of Cr plate sputtering target is more than 82% by cold isostatic pressing + vacuum sintering; after rolling, the target density of Cr plate is increased to 90% - 95%; the sputtering target density of Cr alloy is more than 98% by hot pressing. By optimizing the sintering time and temperature, the sintering cost of chromium ring target is greatly reduced.

Application:

1. Metal chromium purity 99% - 99.5%: used for alloy additives, cermet, powder metallurgy, hard alloy, diamond tools, diamond products, electrical alloy, flux cored wire, welding materials, aluminum alloy additives, thermal spraying materials, high temperature and high wear-resistant materials, optical coating materials, chemical products, etc.

2. Purity of metal chromium 99.5% - 99.9%: used for physical vapor deposition, high temperature alloy, hot isostatic pressing chromium target raw materials, cermet, hard alloy addition, welding materials, diamond tools, laser cladding, spraying, etc.

3. The purity of metal chromium is more than 99.9%; it is used for aerospace materials, steam turbines, coating targets, etc.