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Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density
Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density
Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density
Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density
Specifications
Brand Name :
JINXING
Model Number :
Zirconium Sputtering Target
Certification :
ISO 9001
Place of Origin :
China
MOQ :
1kg
Price :
20～100USD/kg
Payment Terms :
L/C, D/A, D/P, T/T, Western Union
Supply Ability :
100000kgs/M
Delivery Time :
10～25 work days
Packaging Details :
Plywood case
Material :
Zirconium Zr702
Process :
HIP , CIP
Size :
Customized
Application :
PVD Coating
Density :
6.506g/cm3
Shape :
Round , Plate , Tube Sputtering target
Grain Size :
Fine Grain Size
Purity :
99.5% , 99.95%
Description

Zirconium Rotatable Sputtering Target

Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target.

Description

JINXING company focus on the sputtering target ( Rotatable sputtering target , Planar Sputtering target , Spray Rotary sputtering target , Noble Metal sputtering target and Evaporation material . Material incluidng ( Ti Titanium, TiAl, TiSi, TiZr , Zr Zirconium , Cr Chrome, Mo, W Tungsten, WTi , Cu, Ni, Ta, Nb ) .

  • Hot Pressing
  • Hot Isostatic Pressing (HIP)
  • Cold Isostatic Pressing (CIP)
  • Vacuum Sintering
  • Induction Melting
  • Vacuum Melting & Casting
  • Arc Melting
  • Electron-Beam Melting
  • Plasma Spraying
  • Co-Precipitation

JINXING has developed a complete line of rotary cathode sputtering targets. Materials are either continuously cast, extruded, HIP'ed or plasma sprayed to provide technological advances in rotary design. In addition, unique profiles can be developed for specific applications to provide targets for better wear characterization, longer life, unique physical characteristics or altered metallurgical properties.

Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target.

Grades: R60702, 99.2%min
Purity: 99.5%
Purity: 99.95% Hf<300ppm or Hf<4.5%)
Shape: Round Shape , Tube Shape and Plate Shape.

Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density

Product tags

pvd sputtering

,

sputtering pvd

,

magnetron sputtering pvd
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Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density

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Product Detail
Brand Name :
JINXING
Model Number :
Zirconium Sputtering Target
Certification :
ISO 9001
Place of Origin :
China
MOQ :
1kg
Price :
20～100USD/kg
Contact Supplier
Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density
Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density

JINXING MATECH CO LTD

Site Member
6 Years
Since 2007
Business Type :
Manufacturer, Distributor/Wholesaler, Importer, Exporter, Seller, Other
Main Products :
Zirconium Bar, Tungsten Copper Alloy, Tungsten Heavy Alloy
Total Annual :
5,000,000-10,000,000
Employee Number :
10~25
Certification Level :
Site Member
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