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Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron
Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron
Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron
Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron
Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron
Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron
Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron
Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron
Specifications
Brand Name :
JINXING
Model Number :
Titanium Sputtering Target
Certification :
ISO 9001
Place of Origin :
China
MOQ :
1kg
Price :
20～200USD/kg
Payment Terms :
L/C, D/A, D/P, T/T, Western Union
Supply Ability :
100000kgs/M
Delivery Time :
10～25 work days
Packaging Details :
Plywood case
Material :
Titanium Cylindrical Sputtering Targets
Process :
CIP, HIP Pressing
Size :
Customized
Application :
PVD Coating system
Shape :
Round , Plate, Tube
Grain Size :
Fine Grain Size, Good density
Purity: :
99.5%， 99。95%
Density :
4.52g/cm3
Description

Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron

high purity Rotatory Titanium sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Specification

Composition Ti
Purity

CP Grade 2 (99.5%), CP Grade 1 (99.7%),

3N5 (99.95%), 4N (99.99%), 4N5 (99.995%)
Density 4.51 g/cm3
Grain Sizes < 50 micron or on request
Fabrication Processes Vacuum Melting, Forging, Extruding, Machining
Shape Straight, Dog Bone
End Types SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made
Surface Ra 1.6 Micron or on request

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Titanium Cylindrical Sputtering Targets Picture:

Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron

Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron

Product tags

magnetron sputtering deposition

,

magnetron sputtering deposition presentation

,

aluminum angle extrusion
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Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron

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Product Detail
Brand Name :
JINXING
Model Number :
Titanium Sputtering Target
Certification :
ISO 9001
Place of Origin :
China
MOQ :
1kg
Price :
20～200USD/kg
Contact Supplier
video
Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron
Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron
Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron
Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron

JINXING MATECH CO LTD

Site Member
6 Years
Since 2007
Business Type :
Manufacturer, Distributor/Wholesaler, Importer, Exporter, Seller, Other
Main Products :
Zirconium Bar, Tungsten Copper Alloy, Tungsten Heavy Alloy
Total Annual :
5,000,000-10,000,000
Employee Number :
10~25
Certification Level :
Site Member
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