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Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating
Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating
Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating
Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating
Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating
Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating
Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating
Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating
Specifications
Brand Name :
JINXING
Model Number :
Titanium Sputtering Target
Certification :
ISO 9001
Place of Origin :
China
MOQ :
1kg
Price :
20～200USD/kg
Payment Terms :
L/C, D/A, D/P, T/T, Western Union
Supply Ability :
100000kgs/M
Delivery Time :
10～25 work days
Packaging Details :
Plywood case
Material :
Ti Sputtering Targets
Process :
CIP, HIP Pressing
Size :
Customized
Application :
PVD Coating system
Shape :
Round , Plate, Tube
Grain Size :
Fine Grain Size, Good density
Purity: :
99.5%， 99。95%
Density :
4.52g/cm3
Description

Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating

Ti Sputtering Targets Information:

It has a melting point of 1,660°C, a density of 4.5 g/cc, and a vapor pressure of 10-4 Torr at 1,453°C. It is a sturdy material which is easily fabricated when heat is applied. Its strong, lightweight characteristics and excellent corrosion resistance make it ideal for ocean liner hulls, aircraft engines, and designer jewelry. Titanium is biocompatible so it can be found in surgical tools and implants. Titanium is generally evaporated in vacuum for the purposes of wear and decorative, semiconductor, and optical coatings.

Customized Ti Sputtering Targets are available upon request. We can custom make the Ti sputtering targets to meet customer's specific requirements and drawings.

Titanium Sputtering Targets ( Ti target )

· Material: High purity (99.5%, 99.995%), ASTM grade 1, ASTM grade 2, TiAl6V4

· Standard: ASTM B 337/B338, ASTM B385-91,ASTM381, ISO 5832/2,JIS H4650,Din 17851

· Shape: Discs (Diameter <350mm), Thickness>1mm Rectangle (Length 1800mm, Width 400mm Thickness>1mm Tube ( Rotory target, OD: 20mm~160mm, Thickness: 2-20mm, Length: custom-made OD>160, Thickness >8mm, length <200)

· Application: Deposited film nitride as Decorate thin film, Deposited film oxidized to TiO2 as beam splitter or insulator

Ti Sputtering Targets picture:

Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD CoatingTi Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating

Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating

Titanium Sputtering Target , Titanium Sputtering Target 99.95%

are available in varying sizes

D100x40mm , D65x6.35mm etc

Product Name Element Purirty Melting Point ℃ Density (g/cc) Available Shapes
High Pure Sliver Ag 4N-5N 961 10.49 Wire, Sheet, Particle, Target
High Pure Aluminum Al 4N-6N 660 2.7 Wire, Sheet, Particle, Target
High Pure Gold Au 4N-5N 1062 19.32 Wire, Sheet, Particle, Target
High Pure Bismuth Bi 5N-6N 271.4 9.79 Particle, Target
High Pure Cadmium Cd 5N-7N 321.1 8.65 Particle, Target
High Pure Cobalt Co 4N 1495 8.9 Particle, Target
High Pure Chromium Cr 3N-4N 1890 7.2 Particle, Target
High Pure Copper Cu 3N-6N 1083 8.92 Wire, Sheet, Particle, Target
High Pure Ferro Fe 3N-4N 1535 7.86 Particle, Target
High Pure Germanium Ge 5N-6N 937 5.35 Particle, Target
High Pure Indium In 5N-6N 157 7.3 Particle, Target
High Pure Magnesium Mg 4N 651 1.74 Wire, Particle, Target
High Pure Magnesium Mn 3N 1244 7.2 Wire, Particle, Target
High Pure Molybdenum Mo 4N 2617 10.22 Wire, Sheet, Particle, Target
High Pure Niobium Nb 4N 2468 8.55 Wire, Target
High Pure Nickel Ni 3N-5N 1453 8.9 Wire, Sheet, Particle, Target
High Pure Lead Pb 4N-6N 328 11.34 Particle, Target
High Pure Palladium Pd 3N-4N 1555 12.02 Wire, Sheet, Particle, Target
High Pure Platinum Pt 3N-4N 1774 21.5 Wire, Sheet, Particle, Target
High Pure Silicon Si 5N-7N 1410 2.42 Particle, Target
High Pure Tin Sn 5N-6N 232 7.75 Wire, Particle, Target
High Pure Tantalum Ta 4N 2996 16.6 Wire, Sheet, Particle, Target
High Pure Tellurium Te 4N-6N 425 6.25 Particle, Target
High Pure Titanium Ti 4N-5N 1675 4.5 Wire, Particle, Target
High Pure Tungsten W 3N5-4N 3410 19.3 Wire, Sheet, Particle, Target
High Pure Zinc Zn 4N-6N 419 7.14 Wire, Sheet, Particle, Target
High Pure Zirconium Zr 4N 1477 6.4 Wire, Sheet, Particle, Target

Product tags

sputtering deposition

,

sputter deposition

,

sputtering thin film deposition
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Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating

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Product Detail
Brand Name :
JINXING
Model Number :
Titanium Sputtering Target
Certification :
ISO 9001
Place of Origin :
China
MOQ :
1kg
Price :
20～200USD/kg
Contact Supplier
video
Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating
Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating
Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating
Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating

JINXING MATECH CO LTD

Site Member
6 Years
Since 2007
Business Type :
Manufacturer, Distributor/Wholesaler, Importer, Exporter, Seller, Other
Main Products :
Zirconium Bar, Tungsten Copper Alloy, Tungsten Heavy Alloy
Total Annual :
5,000,000-10,000,000
Employee Number :
10~25
Certification Level :
Site Member
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