Ti70Al30 Sputtering Targets
JX offers a wide range of Ti Al Sputtering Targets for decorative and/or wear resistance coatings to provide black, gold, silver, red and rainbow color simulation on items such as cell phone, watch, glasses, bath parts and hardware, artwork, etc.
Ti, Cr, Zr, TiAl, Ni, Cu, Stainless Steel, etc.
Cr and TiAl targets from JX are produced by hot isostatic pressing (HIP) process which can provide the character of high purity, high density, homogenous composition and fine grain. Both planar and rotary targets can be provided on request.
Ti Al Sputtering Targets
Properies of TiAl Target
Purity >99.8% (2N8)
Relative Density >99.6%
Grain Size <100μm
Dimension Max Length: 1800mm; Max Width: 350mm Max Dia: 500mm
Typical Products Ti-33Al, Ti-40Al, Ti-50Al, Ti-67Al, Ti-70Al, Ti-75Al (at%)
Other special specifications are available on customers' request.
Name | Titanium Aluminum Alloy Sputtering Targets TIAL target |
Shape | Square /round, according to your request |
Available size | Round: dia 25~250mm Rectangular: length up to 1500mm Customization is available |
Proportion(wt%) | 5-80 ± 0.2Ti at your request. |
Impurity content | low |
Certificates | ISO9001:2008, the third test report |
Technics | Vacuum melting |
Application | widely used in coating processing industries a: architectural glass, car using glass, graphic display field. b:electronic and semiconductor field. c:decoration and mould field. |
Advantage | High Hard texture Low impurity content Better heat dissipation High Tensile strength |
Ti Al Sputtering Targets Picture:

